Method and apparatus for local vectorial particle cleaning
AssigneeOramir Semiconductor Equipment Ltd.
InventorsYoram Uziel, Natalie Levinsohn, David Yogev, Yehuda Elisha, Yitzhak Ofer, Lev Fris Man, Jonathan Baron
Life of this patent
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Abstract
Particles are removed from the surface of a substrate. Respective position coordinates of the particles on the surface are determined. A beam of electromagnetic energy is directed at the coordinates of each of the particles in turn, such that absorption of the electromagnetic energy at the surface causes the particles to be dislodged from the surface substantially without damage to the surface itself.
Claims37
A method for removing particles from a surface of a substrate, comprising:
- determining respective position coordinates of the particles on the surface;
- and
- directing a beam of electromagnetic energy at the position coordinates of each of the particles in turn, such that absorption of the electromagnetic energy at the surface causes the particles to be dislodged from the surface substantially without damage to the surface itself.
An apparatus for detecting and removing particles from a surface of a substrate, comprising:
- a particle localization device, adapted to determine respective position coordinates of the particles on the surface;
- and
- a particle removal device, coupled to receive the position coordinates from the particle localization device, and comprising an energy source which is configured to direct a beam of electromagnetic energy at the position coordinates of each of the particles in turn, such that absorption of the electromagnetic energy at the surface causes the particles to be dislodged from the surface substantially without damage to the surface itself.
An apparatus for removing particles from a surface of a substrate, comprising:
- a coordinate processor, adapted to receive input position coordinates of the particles on the surface and to determine, responsive to the input coordinates, output position coordinates for controlling the apparatus;
- and
- an energy source, which is configured to direct a beam of electromagnetic energy at each of the particles in turn, responsive to the output position coordinates, such that absorption of the energy at the surface causes the particles to be dislodged from the surface substantially without damage to the surface itself.
An apparatus for removing contaminants from a surface of a substrate, comprising:
- a rotating chuck, which is configured to receive the substrate and to rotate the substrate about an axis of the chuck;
- and
- an energy source which is configured to direct a beam of electromagnetic energy over the surface of the substrate, causing the contaminants to be dislodged from the surface, and to scan the beam in a radial direction with respect to the axis, in cooperation with the rotation of the chuck, so as to impinge upon substantially any point on the surface from which the contaminants are to be removed.
A method for removing contaminants from a surface of a substrate, comprising:
- rotating the substrate about an axis thereof;
- directing a beam of electromagnetic energy over the surface of the substrate, causing the contaminants to be dislodged from the surface;
- and
- scanning the beam in a radial direction with respect to the axis, in cooperation with rotating the substrate, so that the beam impinges upon substantially any point on the surface from which the contaminants are to be removed.
Dependencies are inferred from the claim text.