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US 6,563,851 B1Granted
Laser diode having an active layer containing N and operable in a 0.6 μm wavelength band
AssigneeRicoh Company, Ltd.
InventorsNaoto Jikutani, Shunichi Sato, Takashi Takahashi
Life of this patent
Estimating the term…
Abstract
An optical semiconductor device operable in a 0.6 μm band includes an active layer of GaInNP sandwiched by a pair of GaInP layers each having a thickness of about 2 molecular layers or less.
Claims24
A laser diode, comprising:
- a substrate of a first conductivity type;
- a first cladding layer having said first conductivity type, said first cladding layer being formed over said substrate epitaxially;
- a first optical waveguide layer formed epitaxially over said first cladding layer;
- an active layer of a group III-V compound semiconductor material formed epitaxially over said first optical waveguide layer;
- a second optical waveguide layer formed epitaxially over said active layer;
- a second cladding layer having a second, opposite conductivity type, said second cladding layer being formed over said second optical waveguide layer epitaxially;
- a first electrode injecting first type carriers having a first polarity into said active layer;
- and
- a second electrode injecting second type carriers having a second, opposite polarity into said active layer,
- between said first optical waveguide layer and said active layer, there is provided an intermediate layer of a group III-V compound semiconductor material substantially free from Al and N in intimate contact with said active layer,
- said active layer having a composition of GaInNP containing therein N as a group V element.
8 more elements
A vertical-cavity laser diode, comprising:
- a substrate having a first conductivity type;
- a first optical reflector provided on said substrate;
- a first cladding layer having said first conductivity type on said first optical reflector in an epitaxial relationship with said substrate;
- a first optical waveguide layer formed epitaxially on said first cladding layer;
- an active layer of a group III-V compound semiconductor material formed epitaxially on said first cladding layer;
- a second optical waveguide layer formed epitaxially on said active layer,
- a second cladding layer having a second, opposite conductivity type on said active layer in an epitaxial relationship with said second optical waveguide layer;
- a second optical reflector provided on said second cladding layer;
- a first ohmic electrode provided in ohmic contact with said substrate;
- a second ohmic electrode provided in ohmic contact with said second cladding layer;
- and
- between said first optical waveguide layer and said active layer, an intermediate layer of a group III-V compound semiconductor material substantially free from Al and N in intimate contact with said active layer,
- said active layer having a composition of GaInNP containing therein N as a group V element.
10 more elements
An optical disk drive, comprising:
- a spindle motor adapted to be mounted with an optical disk, said spindle motor rotating said optical disk mounted thereon;
- and
- an optical pickup focusing an optical beam on a recording surface of said optical disk mounted on said spindle motor,
- said optical pickup including a vertical-cavity layer diode comprising:
- a substrate having a first conductivity type;
- a first optical reflector provided on said substrate;
- a first cladding layer having said first conductivity type on said first optical reflector in an epitaxial relationship with said substrate;
- a first optical waveguide layer formed epitaxially on said first cladding layer;
- an active layer of a group III-V compound semiconductor material formed epitaxially on said first optical waveguide layer;
- a second optical waveguide layer formed epitaxially on said active layer;
- a second cladding layer having a second, opposite conductivity type on said second optical waveguide layer in an epitaxial relationship with said active layer;
- a second optical reflector provided on said second cladding layer;
- a first ohmic electrode provided in ohmic contact with said substrate;
- a second ohmic electrode provided in ohmic contact with said second cladding layer;
- and
- between said first optical waveguide layer and said active layer, an intermediate layer of a group III-V compound semiconductor material substantially free from Al and N in intimate contact with said active layer,
- said active layer having a composition of GaInNP containing therein N as a group V element.
14 more elements
An optical transmission system including an optical transmitter and a plastic optical fiber coupled optically with said optical transmitter, said optical transmitter including a vertical cavity laser diode comprising:
- a substrate having a first conductivity type;
- a first optical reflector provided on said substrate;
- a first cladding layer having said first conductivity type on said first optical reflector in an epitaxial relationship with said substrate;
- a first optical waveguide layer formed on said first cladding layer epitaxially;
- an active layer of a group III-V compound semiconductor material formed epitaxially on said, first optical waveguide layer;
- a second optical waveguide layer formed on said active layer epitaxially;
- a second cladding layer having a second, opposite conductivity type on said second optical waveguide layer in an epitaxial relationship with said active layer;
- a second optical reflector provided on said second cladding layer;
- a first ohmic electrode provided in ohmic contact with said substrate;
- a second ohmic electrode provided in ohmic contact with said second cladding layer;
- and
- between said first optical waveguide layer and said active layer, an intermediate layer of a group III-V compound semiconductor material substantially free from Al and N in intimate contact with said active layer,
- said active layer having a composition of GaInNP containing therein N as a group V element.
10 more elements
An optical semiconductor device, comprising:
- a substrate;
- a first layer of a III-V compound semiconductor material formed over said substrate epitaxially, said first layer being substantially free from N;
- an active layer of a III-V compound semiconductor material formed over said first layer epitaxially in intimate contact therewith, said active layer containing N as a group V element;
- a second layer of a III-V compound semiconductor material formed over said active layer epitaxially in intimate contact therewith, said second layer being substantially free from N,
- an interface between said first layer and said active layer contains C with a concentration level exceeding a concentration level of C in any of said first and active layers.
2 more elements
Dependencies are inferred from the claim text.