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US 6,556,648 B1Granted
Lithographic apparatus, device manufacturing method, and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorsMatthieu Frederic Bal, Florian Bociort, Josephus Johannes Maria Braat
Life of this patent
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Abstract
A classification system for systems of n mirrors, whereby systems of mirrors are classified by a number C, is defined as follows: C = ∑ i = 1 n a i · 2 ( n - i ) ( M [LeftBracketingBar] M [RightBracketingBar] ) where: ai=1 if the angle of incidence of the chief ray at mirror i is negative, ai=0 if the angle of incidence of the chief ray at mirror i is positive, M is the magnification of the projection system, and index i numbers the mirrors of the system in series. Four mirror systems, six mirror systems and eight mirror systems in accordance with the present invention are useful in EUV lithography projection systems.
Claims38
A lithographic projection apparatus comprising:
- a radiation system to provide a projection beam of radiation;
- a support structure adapted to support patterning structure which can be used to pattern the projection beam according to a desired pattern;
- a substrate table to hold a substrate;
- a projection system to project the patterned beam onto a target portion of the substrate,
- wherein said projection system includes precisely four imaging mirrors in the optical path of the projection beam and has an incidence angle classification, C, of 2(−), 6(−), or 9(−), where:
- C = ∑ i = 1 4 a i · 2 ( 4 - i ) ( M [LeftBracketingBar] M [RightBracketingBar] )
- ai=1 if an angle of incidence of a chief ray at mirror i is negative,
- ai=0 if the angle of incidence of the chief ray at mirror i is positive,
- M is a magnification of the projection system, and
- the index i numbers the mirrors from object to image.
7 more elements
A lithographic projection apparatus comprising:
- a radiation system to provide a projection beam of radiation;
- a support structure adapted to support patterning structure which can be used to pattern the projection beam according to a desired pattern;
- a substrate table to hold a substrate;
- a projection system to project the patterned beam onto a target portion of the substrate,
- wherein said projection system has precisely six imaging mirrors in the optical path of the projection beam and has an incidence angle classification, C, of 5(+), 6(−), 9(+), 13(+), 18(−), 21(+), 22(−), 25(+), 29(+), 34(−), 37(+), 38(−), 42(−), or 54(−), where:
- C = ∑ i = 1 6 a i · 2 ( 6 - i ) ( M [LeftBracketingBar] M [RightBracketingBar] )
- ai=1 if an angle of incidence of a chief ray at mirror i is negative,
- ai=0 if the angle of incidence of the chief ray at mirror i is positive,
- M is a magnification of the projection system, and
- the index i numbers the mirrors from object to image.
7 more elements
A device manufacturing method comprising:
- projecting the patterned beam onto a target portion of the substrate, wherein said projection system has precisely six imaging mirrors in the optical path of the projection beam and has an incidence angle classification, C, of 5(+), 6(−), 9(+), 13(+), 18(−), 21(+), 22(−), 25(+), 29(+), 34(−), 37(+), 38(−), 42(−), or 54(−), where:
- C = ∑ i = 1 6 a i · 2 ( 6 - i ) ( M [LeftBracketingBar] M [RightBracketingBar] )
- ai=1 if an angle of incidence of a chief ray at mirror i is negative,
- ai=0 if the angle of incidence of the chief ray at mirror i is positive,
- M is a magnification of the projection system, and
- the index i numbers the mirrors from object to image.
3 more elements
A lithographic projection apparatus comprising:
- a radiation system to provide a projection beam of radiation;
- a support structure adapted to support patterning structure which can be used to pattern the projection beam according to a desired pattern;
- a substrate table to hold a substrate;
- a projection system to project the patterned beam onto a target portion of the substrate,
- wherein said projection system has precisely eight imaging mirrors in the optical path of the projection beam and has an incidence angle classification, C, of 2(+), 5(+), 9(+), 12(+), 13(+), 18(+), 18(−), 19(+), 20(+), 21(+), 22(+), 23(+), 25(+), 26(+), 34(−), 36(+), 37(+), 38(−), 45(+), 46(+), 49(+), 52(+), 53(+), 54(+), 54(−), 55(−), 59(−), 68(+), 69(+), 73(+), 74(+), 77(+), 82(+), 82(−), 85(+), 88(+), 89(+), 90(−), 92(+), 93(+), 97(+), 100(−), 101(+), 102(−), 104(+), 105(+), 106(+), 106(−), 107(+), 108(+), 109(+), 109(−), 110(+), 110(−), 111(+), 113(+), 116(+), 117(+), 118(+), 118(−), 120(+), 121(+), 122(−), 123(−), 132(+), 133(+), 134(−), 137(+), 138(+), 141(+), 145(+), 145(−), 146(+), 146(−), 147(+), 148(+), 148(−), 149(+), 150(+), 150(−), 151(+), 151(−), 152(−), 153(+), 154(+), 154(−), 155(+), 155(−), 156(+), 157(+), 159(+), 161(+), 162(−), 163(−), 164(+), 165(+), 166(+), 166(−), 167(+), 168(+), 169(+), 170(+), 170(−), 171(+), 172(+), 173(+), 174(+), 175(+), 176(+), 177(+), 178(−), 179(+), 180(+), 180(−), 181(+), 181(−), 182(+), 182(−), 183(+), 183(−), 184(+), 185(+), 185(−), 186(−), 187(+), 187(−), 188(−), 189(+), 196(+), 197(+), 201(+), 203(+), 205(+), 209(+), 214(−), 216(+), 217(+), 218(+), 218(−), 225(+), 228(+), 229(+), 230(+), 232(+), 233(+), 235(+), 236(+), 237(+), 238(−), 243(+), 246(+), 247(+), 248(+), 250(−), where:
- C = ∑ i = 1 8 a i · 2 ( 8 - i ) ( M [LeftBracketingBar] M [RightBracketingBar] )
- ai=1 if an angle of incidence of a chief ray at mirror i is negative,
- ai=0 if the angle of incidence of the chief ray at mirror i is positive,
- M is a magnification of the projection system, and
- the index i numbers the mirrors from object to image.
7 more elements
A device manufacturing method comprising:
- projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material on a substrate using an imaging system including precisely four imaging mirrors in the optical path of the projection beam and has an incidence angle classification, C, of 2(−), 6(−), or 9(−), where:
- C = ∑ i = 1 4 a i · 2 ( 4 - i ) ( M [LeftBracketingBar] M [RightBracketingBar] )
- ai=1 if an angle of incidence of a chief ray at mirror i is negative,
- ai=0 if the angle of incidence of the chief ray at mirror i is positive,
- M is a magnification of the projection system, and
- the index i numbers the mirrors from object to image.
3 more elements
A device manufacturing method comprising:
- projecting the patterned beam onto a target portion of the substrate, wherein said projection system has precisely eight imaging mirrors in the optical path of the projection beam and has an incidence angle classification, C, of C, of 2(+), 5(+), 9(+), 12(+), 13(+), 18(+), 18(−), 19(+), 20(+), 21(+), 22(+), 23(+), 25(+), 26(+), 34(−), 36(+), 37(+), 38(−), 45(+), 46(+), 49(+), 52(+), 53(+), 54(+), 54(−), 55(−), 59(−), 68(+), 69(+), 73(+), 74(+), 77(+), 82(+), 82(−), 85(+), 88(+), 89(+), 90(−), 92(+), 93(+), 97(+), 100(−), 101(+), 102(−), 104(+), 105(+), 106(+), 106(−), 107(+), 108(+), 109(+), 109(−), 110(+), 110(−), 111(+), 113(+), 116(+), 117(+), 118(+), 118(−), 120(+), 121(+), 122(−), 123(−), 132(+), 133(+), 134(−), 137(+), 138(+), 141(+), 145(+), 145(−), 146(+), 146(−), 147(+), 148(+), 148(−), 149(+), 150(+), 150(−), 151(+), 151(−), 152(−), 153(+), 154(+), 154(−), 155(+), 155(−), 156(+), 157(+), 159(+), 161(+), 162(−), 163(−), 164(+), 165(+), 166(+), 166(−), 167(+), 168(+), 169(+), 170(+), 170(−), 171(+), 172(+), 173(+), 174(+), 175(+), 176(+), 177(+), 178(−), 179(+), 180(+), 180(−), 181(+), 181(−), 182(+), 182(−), 183(+), 183(−), 184(+), 185(+), 185(−), 186(−), 187(+), 187(−), 188(−), 189(+), 196(+), 197(+), 201(+), 203(+), 205(+), 209(+), 214(−), 216(+), 217(+), 218(+), 218(−), 225(+), 228(+), 229(+), 230(+), 232(+), 233(+), 235(+), 236(+), 237(+), 238(−), 243(+), 246(+), 247(+), 248(+), 250(−), where:
- C = ∑ i = 1 8 a i · 2 ( 8 - i ) ( M [LeftBracketingBar] M [RightBracketingBar] )
- ai=1 if an angle of incidence of a chief ray at mirror i is negative,
- ai=0 if the angle of incidence of the chief ray at mirror i is positive,
- M is a magnification of the projection system, and
- the index i numbers the mirrors from object to image.
3 more elements
Dependencies are inferred from the claim text.