Stitched write head design having a sunken shared pole
AssigneeHeadway Technologies, Inc.
InventorsMao-Min Chen, Po-Kang Wang, Cherng-Chyi Han
Life of this patent
Estimating the term…
Loading patent…
AssigneeHeadway Technologies, Inc.
InventorsMao-Min Chen, Po-Kang Wang, Cherng-Chyi Han
Estimating the term…
A structure and a method for a stitched write head having a sunken share pole. The method includes forming a bottom coil dielectric layer over the first half shared pole. Coils are formed over the bottom coil dielectric layer. Next, second half shared poles (P1) are formed over the first half shared pole (S2). We form a top coil dielectric layer over the structure. In a key step, we chemical-mechanical polish the top coil dielectric layer. A write gap layer (WG) is formed over the front second half shared pole and the top coil dielectric layer over the coils. An upper pole (P3) and hard mask are formed over the write gap layer. We etch the write gap layer and the second half shared pole (P1) using the upper pole as an etch mask to remove a portion of the second half shared pole (P1) adjacent to the write gap layer thereby forming a partially trimmed pole.
A write head having a sunken share pole comprising:
A write head having a sunken share pole comprising:
A write head having a sunken share pole comprising:
A write head having a sunken share pole comprising:
Dependencies are inferred from the claim text.