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US 6,556,278 B1Granted
Exposure/imaging apparatus and method in which imaging characteristics of a projection optical system are adjusted
AssigneeNikon Corporation
InventorsMasashi Tanaka, Masato Kumazawa, Kinya Kato, Masaki Kato, Hiroshi Chiba, Hiroshi Shirasu
Life of this patent
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Abstract
An exposure/imaging apparatus and method effects projection exposure while moving a first object and a second object in a predetermined moving direction, effecting projection exposure of an image of the first object onto the second object. An adjusting member is used to adjust imaging characteristics of a projection optical system that is used to perform the projection exposure.
Claims62
An exposure apparatus which transfers a pattern of a mask onto a substrate, comprising:
- a projection optical system arranged in an optical path between the mask and the substrate, which projects the pattern of the mask onto the substrate, the projection optical system including a reflection surface that forms a bi-directional optical path, and projecting the pattern such that portions of the pattern overlap each other;
- and
- an adjusting member arranged in an optical path between the mask and the substrate excluding the bi-directional optical path, which is used for adjustment of imaging characteristics of the projection optical system,
- wherein the pattern is projected onto the substrate while moving the mask and the substrate in a predetermined direction.
1 more element
An exposure method of transferring a pattern of a mask onto a substrate, comprising:
- providing a projection optical system which projects the pattern of the mask onto the substrate, in an optical path between the mask and the substrate, the projection optical system including a reflection surface, the projection optical system projecting the pattern such that portions of the pattern overlap each other;
- forming a bi-directional optical path in a part of the optical path between the mask and the substrate by using the reflection surface of the projection optical system;
- providing an adjusting member which is used to adjust imaging characteristics of the projection optical system, in an optical path between the mask and the substrate excluding the bi-directional optical path,
- wherein the pattern is projected onto the substrate while moving the mask and the substrate in a predetermined direction.
1 more element
An exposure apparatus which transfers a pattern of a mask onto a substrate, comprising:
- a projection optical system arranged in an optical path between the mask and the substrate, which projects the pattern of the mask onto the substrate, and projecting the pattern such that portions of the pattern overlap each other;
- and
- an adjusting member arranged in the optical path between the mask and the substrate, which is used for adjustment of imaging characteristics of the projection optical system, the adjusting member comprises a movable optical member,
- wherein the pattern is projected onto the substrate while moving the mask and the substrate in a predetermined direction;
- wherein the substrate is moved in a direction intersecting the predetermined direction between a first scanning exposure operation in which the pattern is projected while moving the mask and the substrate in the predetermined direction, and a second scanning exposure operation in which the pattern is projected while moving the mask and the substrate in the predetermined direction;
- and
- wherein a moving amount of the substrate along the direction intersecting the predetermined direction accounts for the adjusted imaging characteristics.
4 more elements
An exposure method of transferring a pattern of a mask onto a substrate, comprising:
- providing a projection optical system which projects the pattern of the mask onto the substrate, in an optical path between the mask and the substrate, the projection optical system projecting the pattern such that portions of the pattern overlap each other;
- and
- providing an adjusting member which is used for adjustment of imaging characteristics of the projection optical system, in the optical path between the mask and the substrate, the adjusting member comprises a movable optical member;
- conducting a first scan exposing in which the pattern is projected while moving the mask and the substrate in a predetermined direction;
- conducting a second scan exposing in which the pattern is projected while moving the mask and the substrate in the predetermined direction;
- and
- moving the substrate in a direction intersecting the predetermined direction between the step of first scan exposing and the step of second scan exposing;
- wherein a moving amount of the substrate along the direction intersecting the predetermined direction accounts for the adjusted imaging characteristics.
5 more elements
An exposure apparatus which transfers a pattern of a mask onto a substrate, comprising:
- a plurality of imaging optical systems arranged in an optical path between said mask and said substrate, each of the imaging optical systems forming a pattern image of said mask onto said substrate,
- wherein while moving said mask and said substrate in a predetermined direction, when said pattern is projected onto the substrate, said pattern images of said plural imaging optical systems overlap each other, and said substrate is movable in a direction intersecting said predetermined direction.
An exposure method of transferring a pattern of a mask onto a substrate, comprising
- providing a plurality of imaging optical systems, each of which forms a pattern image of said mask onto said substrate, in an optical path between said mask and said substrate;
- performing a first scanning exposure operation in which, while moving said mask and said substrate in a predetermined direction, said pattern is projected onto said substrate and said pattern images formed by said plural imaging optical systems overlap each other;
- performing a second scanning exposure operation in which, while moving said mask and said substrate in the predetermined direction, said pattern is projected onto said substrate and said pattern images formed by said plural imaging optical system overlap each other;
- and
- moving said substrate in a direction intersecting said predetermined direction.
2 more elements
An imaging method of forming an image on a first plane onto a second plane, comprising:
- providing an imaging optical system which forms the image of the first plane onto the second plane;
- guiding a light from the first plane to outside of the imaging optical system;
- and
- guiding a light from the outside of the imaging optical system to the second plane via the imaging optical system.
1 more element
An exposure method of transferring a pattern of a mask onto a substrate, comprising:
- forming an intermediate image of said pattern;
- and
- forming a secondary image of said pattern on said substrate,
- wherein magnification relationships between said mask and said intermediate image, between said intermediate image and said secondary image is other than +1 and −1, and the magnification between said mask and said secondary image is one.
1 more element
An exposure method of transferring a pattern of a mask onto a substrate, comprising:
- providing a projection optical system which projects the pattern of the mask onto the substrate, in an optical path between the mask and the substrate, and that projects the pattern such that portions of the pattern overlap each other;
- providing a movable adjusting member which adjusts imaging characteristics of the projection optical system, in the optical path between the mask and the substrate;
- adjusting the imaging characteristics in response to expansion and contraction of the substrate;
- and
- projecting the pattern onto the substrate while the mask and the substrate are moved in a predetermined direction;
- wherein the adjusting step determines an overlap amount accounting for the adjusted imaging characteristics.
3 more elements
An exposure apparatus which transfers a pattern of a mask onto a substrate, comprising:
- a projection optical system arranged in an optical path between the mask and the substrate, which projects the pattern of the mask onto the substrate, the projection optical system projecting the pattern such that portions of the pattern overlap each other;
- and
- a movable adjusting member arranged in the optical path between the mask and the substrate, which adjusts imaging characteristics of the projection optical system in response to expansion and contraction of the substrate,
- wherein the pattern is projected while moving the mask and the substrate in a predetermined direction;
- and wherein an overlap amount is determined accounting for the adjusted imaging characteristics.
2 more elements
A projection optical system which forms an image of a first surface onto a second surface, comprising:
- an imaging optical system having two conjugate points;
- and
- a light beam transfer member arranged on a first side of the two conjugate points, and which causes the light beam that emerges from the imaging optical system to re-enter into the imaging optical system at a position that is different from a position at which the light beam emerged from the imaging optical system.
A projection optical system which forms an image of a first surface onto a second surface, comprising:
- an imaging optical system having two conjugate points;
- a field dividing member arranged on a first side of the two conjugate points, and which divides a field of the imaging optical system;
- and
- a light beam transfer member arranged on a second side of the two conjugate points, and which transfers the light beam passing through the field dividing member and the imaging optical system in a direction intersecting an optical axis of the imaging optical system.
1 more element
A method of manufacturing a projection optical system which forms an image of a first surface onto a second surface, comprising the steps of:
- providing an imaging optical system;
- providing a field dividing member which spatially divides a field of the imaging optical system;
- providing a light beam transfer member which transfers light passing through the field dividing member and the imaging optical system in a direction intersecting an optical axis of the imaging optical system;
- detecting an optical axis of the imaging optical system;
- positioning the field dividing member with respect to the optical axis of the imaging optical system;
- and
- positioning the light beam transfer member.
4 more elements
A projection optical system which forms an image of a first surface onto a second surface, comprising:
- an imaging optical system having at least one reflection surface with an optical axis which is co-axial with respect to an optical axis of the imaging optical system;
- a first beam splitter arranged on an optical path between the imaging optical system and the first surface;
- and
- a second beam splitter arranged on an optical path between the imaging optical system and the second surface;
- wherein a light beam from the second beam splitter is transferred in a direction intersecting the optical axis to be guided to the first beam splitter.
2 more elements
Dependencies are inferred from the claim text.