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US 6,555,298 B1Granted
Method and apparatus for uniformly baking substrates such as photomasks
AssigneeMicron Technology, Inc.
InventorJ. Brett Rolfson
Life of this patent
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Abstract
A method and apparatus for baking a film onto a substrate. A film, such as a layer of photoresist, is disposed on a first surface of a substrate while a second surface is exposed to a liquid bath. The liquid bath is maintained at a pre-selected temperature. Exposure of the substrate to the liquid bath allows the film on the opposite surface to bake. The liquid bath is then re-circulated to maintain a constant and uniform temperature gradient across the substrate.
Claims18
A method of baking a substrate comprising:
- providing a substrate having a first surface wherein a film is disposed on the second surface;
- exposing only the second surface to a liquid bath;
- controlling the temperature of the liquid bath;
- maintaining the exposure of the second surface to the liquid bath for a predetermined time to allow the film to bake on the first surface;
- and
- subjecting the film to an independent secondary heat source simultaneously with the exposure of the second surface to the liquid bath.
3 more elements
A method of baking a substrate comprising:
- providing a substrate having a first surface and a second surface wherein a film is disposed on the first surface;
- exposing the second surface to a liquid bath;
- controlling the temperature of the liquid bath;
- maintaining the exposure of the second surface to the liquid bath for a predetermined time to allow the film to bake on the first surface;
- and
- subjecting the film to an independent secondary heat source simultaneously with the exposure of the second surface to the liquid bath.
3 more elements
Dependencies are inferred from the claim text.