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AssigneesSony Corporation, Agency of Industrial Science and Technology
InventorsMinehiro Tonosaki, Yutaka Takei, Hiroyuki Okita, Yuji Horino, Akiyoshi Chayahara, Atsushi Kinomura, Nobuteru Tsubouchi
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A surface hardening method for resins and a surface hardened resin, capable of reforming the surface of a plastic disk substrate at low energy in a short time, and a production device of such a resin is disclosed. The formation of an ion-implanted layer 11 by implanting equal to or more than 1017 carbon ions per cm2 into the surface of a plastic disk substrate 10 at equal to or less than 20 KeV and the formation of a thin film 12 of high hardness on the ion-implanted layer 11 can be performed alternately or simultaneously, and the hardening rate is increased further by using a bias device.
A method for hardening a resin surface comprising the steps of:
A method for hardening a resin surface comprising carbon or silicon ion implantation so as to implant ions equal to or more than 1017 ions per cm2 at equal to or less than 20 KeV and a physical film deposition on a surface of a resin, to harden the surface of the resin.
A method for hardening a resin surface comprising carbon or silicon ion implantation on a surface of a resin so as to implant ions equal to or more than 1017 ions per cm2 at equal to or less than 20 KeV under influence of a bias electric field, to harden the surface of the resin.
Dependencies are inferred from the claim text.