Photosensitive material processing device
AssigneeFuji Photo Film Co., Ltd.
InventorsRyoei Nozawa, Toshihiro Suya, Hideto Yamamoto, Takayuki Iwamoto, Shinichi Matsuda
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AssigneeFuji Photo Film Co., Ltd.
InventorsRyoei Nozawa, Toshihiro Suya, Hideto Yamamoto, Takayuki Iwamoto, Shinichi Matsuda
Estimating the term…
In a shutter facing an aperture portion in a partition plate in a photosensitive material processing device, a blocking member, formed substantially in a semicircular cylindrical shape, is placed by the rotation of a shaft between blades thereby closing the aperture portion. The opening between the blades is opened by rotating the blocking member integrally with the shaft so that a photosensitive material can pass through. Multi-leveled surfaces are formed on the top surface of a guide plate. Aperture portions for mounting rollers with adaptors are formed in an alternating pattern on the surfaces. A plurality of protruding guide ribs are provided extending across the surfaces. A plurality of brush roller parameters are adjusted so that a winding mark index defined by the parameters falls within a predetermined range. Rollers are washed when a finisher control system is restarted after an unforeseen long stoppage.
A guide structure for a photosensitive material processing device provided in a photosensitive material processing device for processing a photosensitive material using processing solutions by immersing the photosensitive material in processing solutions stored in processing tanks while transporting the photosensitive material, comprising:
Dependencies are inferred from the claim text.