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US 6,554,507 B2Granted
Pattern formation method and apparatus
AssigneeNippon Telegraph and Telephone Corporation
InventorHideo Namatsu
Life of this patent
Estimating the term…
Abstract
In this invention, resist patterns formed by development are dried using a supercritical fluid such that no moisture enters the patterns.
Claims8
A pattern formation apparatus comprising:
- a closable reaction chamber in which a substrate to be processed is placed;
- supply means for supplying supercritical carbon dioxide into said reaction chamber;
- pressure control means for controlling an internal pressure of said reaction chamber;
- and
- temperature control means for controlling an internal temperature of said reaction chamber to a predetermined temperature within a range in which no moisture condensation occurs in said reaction chamber.
2 more elements
A pattern formation apparatus comprising:
- a closable reaction chamber in which a substrate to be processed is placed, wherein inner walls of said reaction chamber are covered with a fluorocarbon resin;
- supply means for supplying supercritical carbon dioxide into said reaction chamber;
- pressure control means for controlling an internal pressure of said reaction chamber;
- and
- temperature control means for controlling an internal temperature of said reaction chamber to a predetermined temperature.
2 more elements
A pattern formation apparatus comprising:
- a closable reaction chamber in which a substrate to be processed is placed;
- first supply means for supplying, into said reaction chamber, a processing fluid not in gaseous state and having not less than a predetermined density higher than in gaseous state;
- second supply means for supplying a supercritical fluid into said reaction chamber;
- pressure control means for controlling an internal pressure of said reaction chamber;
- and
- temperature control means for controlling an internal temperature of said reaction chamber to a predetermined temperature,
- wherein said processing fluid is a gas in steady state.
4 more elements
Dependencies are inferred from the claim text.