ArF laser with low pulse energy and high rep rate

A very narrow band reliable modular production quality high repetition rate ArF excimer laser for producing a narrow band pulsed laser beam at repetition rates of at least about 3000 Hz, said laser comprising:

• A. a quickly replaceable laser chamber module comprising a laser chamber comprising:
• 1) two elongated electrodes;
• 2) a laser gas comprised of
• a) argon,
• b) fluorine, and
• c) a neon gas;
• 3) a gas circulator for circulating said gas between said electrodes at speeds of at least two cm/millisecond
• B. a modular pulse power system comprised of at least one quickly replaceable module, said system being comprised of a power supply and pulse compression and amplification circuits and pulse power controls for producing high voltage electrical pulses of at least 14,000 volts across said electrodes at rates of at least about 3000 Hz;
• C. a quickly replaceable line narrowing module for controlling wavelengths of said laser beams to less than that 0.4 pm, FWHM;
• and
• D. a laser pulse energy control system for controlling the voltage provided by said pulse power system, said control system comprising a laser pulse energy monitor and a computer processor programmed with an algorithm for calculating, based on historical pulse energy data, electrical pulses needed to produce laser pulses having pulse energies within a desired range of energies of less than 04. mJ.