Catoptric optical element, illumination optical system equipped therewith, projection exposure apparatus and method for manufacturing semiconductor device

An illumination optical system for illuminating an illumination plane, the illumination optical system comprising:

• a light source that provides a light flux;
• a catoptric element including a hollow member having an inner reflective surface that reflects light having a wavelength shorter than about 157 nm, which generates a plurality of images of the light source by internally reflecting the light flux supplied from the light source;
• and
• a relay optical system that leads the light from the catoptric element to the illumination plane.

A catoptric element comprising a member having:

• an input surface that receives incident light;
• an exit surface through which light that has entered the member through the input surface exits the member;
• and
• the member being hollow between the input surface and the exit surface to define an inner reflective surface, extending between the input surface and the exit surface, the inner reflective surface reflects light having a wavelength shorter than about 157 nm.