Exposure method and apparatus

An exposure apparatus for projecting a pattern of mask onto a substrate through an optical projecting system while synchronously scanning a mask having the pattern and the substrate in a predetermined scanning direction;

• wherein the optical projecting system includes a scanning direction adjuster configured to adjust a position of scanning direction of a projected image to be projected onto the substrate;
• wherein the optical projecting system includes a plurality of optical projecting system modules disposed along a direction intersecting the scanning direction;
• and
• wherein the scanning direction adjuster adjusts the position of a projected image in the scanning direction of each of the plurality of optical projecting system modules.

An exposure apparatus for projecting a pattern of mask onto a substrate through an optical projecting system while synchronously scanning a mask having the pattern and the substrate in a predetermined scanning direction;

• wherein the optical projecting system includes a scanning direction adjuster configured to adjust the position of scanning direction of a projected image to be projected onto the substrate;
• wherein the scanning direction adjuster includes at least one of a magnification adjustment mechanism configured to adjust a magnification of the optical projecting system and an image rotation mechanism configured to rotate a projected image produced through the optical projecting system;
• and
• wherein the optical projecting system includes a combination of a pair of a Dyson type optical systems each system including a reflecting prism, a driving member for driving the reflecting prism, lens and a concave mirror.

An exposure method for projecting a pattern of mask onto a substrate through an optical projecting system while synchronously scanning a mask having the pattern and the substrate in a predetermined scanning direction, the method comprising:

• adjusting a position of scanning direction of a projected image to be projected onto the substrate by the optical projecting system;
• wherein the optical projecting system includes a plurality of optical projecting system modules disposed along a direction intersecting the scanning direction;
• and
• wherein the adjustment of position of scanning direction is performed by adjusting the position of a projected image in the scanning direction of each of the plurality of optical projecting system modules.

An exposure method for projecting a pattern of mask onto a substrate through an optical projecting system while synchronously scanning a mask having the pattern and the substrate in a predetermined scanning direction, the method comprising:

• adjusting a position of scanning direciton of a projected image to be projected onto the substrate;
• and
• performing at least one of adjusting a magnification of the optical projecting system and rotating an image projected through the optical projecting system,
• wherein the optical projecting system includes a scanning direction adjuster configured to adjust a position of scanning direction of a projected image to be projected onto the substrate;
• and
• wherein the optical projecting system includes a combination of a pair of Dyson type optical system each system including a reflecting prism, a driving member for driving the reflecting prism, lens and a concave mirror.