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US 6,552,350 B2Granted
System and method for providing a lithographic light source for a semiconductor manufacturing process
AssigneeAdvanced Energy Systems, Inc.
InventorsEdwin G. Haas, Robert M Gutowski, Vincent S. Calia
Life of this patent
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Abstract
A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.
Claims27
A method for providing a lithographic light source, comprising:
- producing a process fluid plume;
- producing a coaxial shielding fluid around the process fluid plume;
- and
- generating a plasma by providing an energy source that impinges on the process fluid plume.
1 more element
A system for providing a lithographic light source, comprising:
- a fluid system, comprising
- a diffuser,
- a holder assembly, and
- a nozzle system operable to produce a process fluid and a coaxial shielding fluid;
- an energy source for directing energy at the process fluid to generate emitted energy;
- and
- an optics system operable to focus the emitted energy on a target.
4 more elements
A method for providing a lithographic light source, comprising:
- providing a fluid system, comprising
- a diffuser,
- a holder assembly, and
- a nozzle system;
- producing a process fluid plume and a coaxial shielding fluid plume from the nozzle system;
- targeting an energy source on the process fluid plume to generate emitted energy;
- and
- providing an optics system operable to focus the emitted energy.
5 more elements
Dependencies are inferred from the claim text.