Substrate temperature adjustment apparatus for estimating a time taken until a substrate temperature falls within a target temperature range
AssigneeCanon Kabushiki Kaisha
InventorNaosuke Nishimura
Life of this patent
Estimating the term…
Abstract
A substrate temperature adjustment apparatus includes a temperature adjustment device for adjusting a temperature of a substrate, and a temperature measurement device for measuring a temperature of the temperature adjustment device, when the temperature is out of a target temperature range. The time taken until the temperature of the substrate falls within the target temperature range is predicted on the basis of the temperature of the temperature adjustment device measured by the temperature measurement device.
Claims12
A substrate temperature adjustment apparatus comprising:
- temperature adjustment means for adjusting a temperature of a substrate;
- and
- temperature measurement means for measuring a temperature of said temperature adjustment means, when the temperature is out of a target temperature range,
- wherein a time taken until the temperature of the substrate falls within the target temperature range is predicted on the basis of the temperature of said temperature adjustment means measured by said temperature measurement means.
An exposure apparatus for exposing a substrate, said apparatus comprising:
- an exposure unit for exposing the substrate;
- and
- a substrate temperature adjustment unit, wherein said substrate temperature adjustment unit includes (i) temperature measurement means for adjusting a temperature of the substrate;
- and (ii) temperature measurement means for measuring a temperature of said temperature adjustment means, when the temperature is out of a target temperature range,
- wherein a time taken until the temperature of the substrate falls within the target temperature range is predicted on the basis of the temperature of said temperature adjustment means measured by said temperature measurement means.
A resist coating apparatus, comprising:
- a resist coating unit for applying a resist to a substrate;
- and
- a substrate temperature adjustment unit, wherein said substrate temperature adjustment unit includes (i) temperature adjustment means for adjusting a temperature of a substrate and (ii) temperature measurement means for measuring a temperature of said temperature adjustment means, when the temperature is out of a target temperature range,
- wherein a time taken until the temperature of the substrate falls within the target temperature range is predicted on the basis of the temperature of said temperature adjustment means measured by said temperature measurement means.
A loading/unloading apparatus for loading/unloading a substrate between a resist coating apparatus and an exposure apparatus, said loading/unloading apparatus comprising:
- a transfer unit for transferring the substrate between the resist coating apparatus and the exposure apparatus;
- and
- a substrate temperature adjustment unit, wherein said substrate temperature adjustment unit includes (i) temperature adjustment means for adjusting a temperature of a substrate, and (ii) temperature measurement means for measuring a temperature of said temperature adjustment means, when the temperature is out of a target temperature range,
- wherein a time taken until the temperature of the substrate falls within the target temperature range is predicted on the basis of the temperature of said temperature adjustment means measured by said temperature measurement means.
A device manufacturing method comprising:
- an application step of applying a resist to a substrate;
- an exposure step of exposing the substrate by an exposure apparatus having a substrate temperature adjustment unit, wherein the substrate temperature adjustment unit includes (i) temperature adjustment means for adjusting a temperature of a substrate, and (ii) temperature measurement means for measuring a temperature of the temperature adjustment means, when the temperature is out of a target temperature range,
- wherein a time taken until the temperature of the substrate falls within the target temperature range is predicted on the basis of the temperature of the temperature adjustment means measured by the temperature measurement means;
- and
- a step of developing the substrate that has been exposed.
Dependencies are inferred from the claim text.