RF matching network with distributed outputs
AssigneeApplied Komatsu Technology, Inc.
InventorsWendell T. Blonigan, Carl A. Sorensen
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AssigneeApplied Komatsu Technology, Inc.
InventorsWendell T. Blonigan, Carl A. Sorensen
Estimating the term…
An apparatus for distributing RF power outputs to a first electrode in a parallel plate electrode system for generating plasma in depositing films on a substrate. A RF power output is applied to a distributed RF matching network to excite a plasma from a process gas stream to deposit a uniform film onto the substrate. The distributed matching network includes a load capacitor for receiving a radio frequency power input and an inductor having first and second ends with the first end coupled to the load capacitor. The matching network also includes multiple drive capacitors each of which couples the second end of the inductor to a different one of multiple points distributed on the first electrode. The capacitance of each drive capacitor is user-selectable, and the points on the backing plate to which the drive capacitors are coupled are user-selectable.
A system for generating plasma in processing a substrate, the system comprising:
A system for generating plasma in depositing films on a substrate, the system comprising:
A method of processing a thin film on a substrate in a vacuum chamber, comprising:
A system for generating plasma in processing a substrate for use with an RF power supply, the system comprising:
A system for generating plasma in depositing films on a substrate, the system comprising:
A method of processing a substrate in a vacuum chamber, comprising:
A method of processing a film on a substrate in a vacuum chamber, comprising:
A system for generating plasma in processing a substrate, the system comprising:
A system for generating plasma in depositing films on a substrate, the system comprising:
Dependencies are inferred from the claim text.