Toroidal low-field reactive gas source
AssigneeApplied Science and Technology, Inc.
InventorsDonald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
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AssigneeApplied Science and Technology, Inc.
InventorsDonald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
Estimating the term…
An improved toroidal low-field plasma source allows plasma ignition within a wider range of gas conditions than permitted by prior art plasma sources. Power efficiency of the plasma source is improved by automatically adjusting the power delivered to the plasma based on the load to the power supply. The plasma source can be operated over a wider pressure range than allowed by prior art plasma sources. The plasma source can be operated so as to increase the output of atomic species from the source. The plasma source can be operated to increase the etch rate of organic materials. The plasma source can efficiently remove hazardous gas compounds from effluent gas streams by converting them into scrubbable products.
A reactive gas source for dissociating gases in a toroidal plasma comprising:
A method for dissociating gases in a plasma comprising:
A plasma chamber for use with a reactive gas source comprising:
A reactive gas source for dissociating gases in a toroidal plasma comprising:
A method for dissociating gases in a plasma comprising:
Dependencies are inferred from the claim text.