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US 6,551,758 B2Granted
Onium salts, photoacid generators, resist compositions, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsYouichi Ohsawa, Jun Watanabe, Kazunori Maeda
Life of this patent
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Abstract
Onium salts of arylsulfonyloxybenzenesulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, improved focal latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris after coating, development and peeling, and improved pattern profile after development.
Claims12
An onium salt of the following general formula (1):
- wherein R1 is a substituted or unsubstituted aryl group of 6 to 14 carbon atoms, R2 which may be the same or different is hydrogen or a substituted or unsubstituted, straight, branched or cyclic alkyl group of 1 to 6 carbon atoms, R0 is a hydroxyl, alkoxy, halogen or nitro group, p, q and r each are 1 or 2, R3 which may be the same or different is a substituted or unsubstituted, straight, branched or cyclic alkyl group of 1 to 10 carbon atoms or substituted or unsubstituted aryl group of 6 to 14 carbon atoms, M is a sulfur or iodine atom, and “a” is equal to 3 when M is sulfur and equal to 2 when M is iodine.
Dependencies are inferred from the claim text.