Plasma processing apparatus and method of processing
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsTetsuhiro Iwai, Ryota Furukawa
Life of this patent
Estimating the term…
Abstract
A plasma processing apparatus and a method of plasma processing using the same obviate a problem in which an excessive amount of processing gas is supplied momentarily during an initial stage of the gas supply. In the process of supplying gas, a main controller outputs to a mass flow controller a flow-rate setting command signal preset for “zero flow” prior to opening a gas shut-off valve, which opens/closes a gas supply passage, and another flow-rate setting command signal set for “a specific flow rate” only after the gas shut-off valve is opened.
Claims8
A plasma processing apparatus for plasma processing of a work object, said plasma processing apparatus comprising:
- a processing chamber;
- a processing chamber evacuation unit operably coupled to said processing chamber;
- a gas importing device for supplying processing gas into said processing chamber through a gas supply passage, said gas importing device including
- a gas shut-off valve for opening and closing the gas supply passage,
- a flow rate detector for detecting a flow rate of the processing gas in the gas supply passage, and
- a flow control valve, having an adjustable orifice, to be coupled to the gas supply passage;
- a main controller for producing a flow-rate setting command signal, and controlling opening and closing of said gas shut-off valve;
- a plasma generator for generating plasma in said processing chamber;
- and
- wherein a feedback controller is operably coupled to said flow control valve and said flow rate detector to control an opening of said adjustable orifice of said flow control valve according to said flow-rate setting command signal and according to the flow rate detected by said flow rate detector.
A method of plasma processing using a plasma processing apparatus having a gas shut-off valve for opening and closing a gas supply passage, a flow rate detector for detecting a flow rate of processing gas in said gas supply passage, a flow control valve coupled to said gas supply passage, a main controller for outputting a flow-rate setting command signal and controlling opening and closing of said gas shut-off valve, and a feedback controller for controlling an orifice opening of said flow control valve according to said flow-rate setting command signal and according to the flow rate detected by said flow rate detector, said method comprising:
- evacuating a processing chamber containing a work object to be processed;
- supplying said processing gas into the evacuated processing chamber, said supplying of said processing gas comprising
- setting the flow-rate setting command signal for zero flow while keeping said gas shut-off valve closed,
- opening said gas shut-off valve, and
- then setting said flow-rate setting command signal for a certain flow rate after said gas shut-off valve is opened;
- and
- generating plasma in said processing chamber filled with said processing gas.
Dependencies are inferred from the claim text.