Gas separation apparatus
AssigneeOrgano Corporation
InventorsTetsuya Abe, Sadamitsu Tanzawa, Seiji Hiroki, Yoshinori Tajima, Takashi Futatsuki
Life of this patent
Estimating the term…
Loading patent…
AssigneeOrgano Corporation
InventorsTetsuya Abe, Sadamitsu Tanzawa, Seiji Hiroki, Yoshinori Tajima, Takashi Futatsuki
Estimating the term…
A discharge gas containing PFC gas including CF4 and NF3 generated from a manufacturing process (10) is adsorbed at an adsorbing device (18) and then desorbed using nitrogen as a purge gas. A desorbed gas with CF4 and NF3 concentrated can be obtained in this manner. The desorbed gas is then supplied to a chromatographic separator (20) for chromatographic separation with nitrogen as a carrier gas. In this manner, CF4 and NF3 within the PFC gas can be separated. In particular, because the gas is once concentrated at the adsorbing device (18), chromatographic separation of the gas constituents can be efficiently performed. By independently concentrating CF4 and NF3 obtained by the chromatographic separation, high purity gas constituents of the PFC gas can be obtained, and reused at the manufacturing process (10).
A gas separation apparatus for separating specific gas constituents from a mixture gas containing a plurality of gas constituents, said apparatus comprising:
Dependencies are inferred from the claim text.