Pad conditioning disk
AssigneeApplied Materials, Inc.
InventorCharles C. Garretson
Life of this patent
Estimating the term…
Abstract
An end effector is provided for conditioning a polishing pad. The end effector comprises a backing plate, a matrix material adhered to a first surface of the backing plate, and a plurality of crystals embedded in the matrix material an amount sufficient to prevent the plurality of crystals from becoming dislodged from the matrix material during pad conditioning. The plurality of crystals have an absolute crystal height distribution that is skewed toward zero. Methods are also provided for forming the above-described end effector.
Claims23
An apparatus comprising:
- an end effector for conditioning a polishing pad, having:
- a backing plate;
- a matrix material adhered to a first surface of the backing plate;
- and
- a plurality of crystals embedded in the matrix material;
- wherein the plurality of crystals have an absolute crystal height distribution that is skewed toward zero relative to a normal absolute crystal height distribution.
An apparatus comprising:
- an inlet for supplying a slurry to a polishing pad;
- a conditioning arm disposed along the polishing pad;
- and
- an end effector coupled to the conditioning arm, the end effector for conditioning the polishing pad;
- the end effector including:
- a backing plate;
- a matrix material adhered to a first surface of the backing plate;
- and
- a plurality of crystals embedded in the matrix material;
- wherein the plurality of crystals have an absolute crystal height distribution that is skewed toward zero relative to a normal absolute crystal height distribution.
A method of forming an end effector comprising:
- obtaining a matrix material having a plurality of crystals extending from a first side of the matrix material, the plurality of crystals having a first absolute crystal height distribution;
- bonding a second side of the matrix material to a backing plate using a bonding material;
- contacting at least a portion of the plurality of crystals to a surface which faces the first side of the matrix material;
- applying a force to the backing plate so as to press the at least a portion of the plurality of crystals against the surface which faces the first side of the matrix material;
- and
- allowing the bonding material to cure during the step of applying the force.
A method of conditioning a polishing pad comprising:
- providing a polishing pad;
- and
- contacting the polishing pad with a conditioner comprising a plurality of crystals embedded in a matrix material such that the plurality of crystals have an absolute crystal height distribution that is skewed toward zero relative to a normal absolute crystal height distribution.
Dependencies are inferred from the claim text.