Apparatus for removing deposits from enclosed chambers

An apparatus for removing baked on organic residues and inorganic residues from a chamber, the apparatus comprising:

• a first cleaning fluid reservoir which holds a first cleaning fluid for removing organic residues;
• a second cleaning fluid reservoir which holds a second cleaning fluid for removing inorganic residues and passivating the chamber;
• a nozzle for spraying the cleaning fluid into the chamber, the sprayed cleaning fluid removing baked on organic residues and inorganic residues from the chamber;
• a first fluid supply line fluidly connecting the first and second cleaning fluid reservoirs of cleaning fluid with the nozzle;
• a first pump fluidly connectable with the nozzle and the first and second cleaning fluid reservoirs for pumping the cleaning fluid-to the chamber;
• a second pump fluidly connectable with the chamber for pumping the cleaning fluid from the chamber.

A method of removing baked on residues from a sterilizer chamber, the method comprising:

• mounting a lid over an opening to the chamber such that a nozzle mounted to the lid extends into an interior of the chamber:
• pumping a first cleaning fluid from a first source of cleaning fluid to the nozzle;
• spraying the first cleaning fluid from the nozzle over walls of the chamber to remove baked on residues from the chamber walls;
• pumping the sprayed first cleaning fluid from the chamber.

A method of removing baked on residues from a sterilizer chamber, the method comprising:

• mounting a lid over an opening to the chamber such that a nozzle mounted to the lid extends into an interior of the chamber:
• pumping a first cleaning fluid from a first source of cleaning fluid to the nozzle;
• spraying the first cleaning fluid from the nozzle over walls of the chamber to remove baked on residues from the chamber walls;
• pumping the sprayed first cleaning fluid from the chamber;
• after pumping the first cleaning fluid to the nozzle, spraying the first cleaning fluid from the nozzle over walls of the chamber, and pumping the sprayed first cleaning fluid from the chamber:
• pumping a second cleaning fluid from a second source of cleaning fluid to the nozzle;
• spraying the second cleaning fluid from the nozzle over the walls of the chamber;
• pumping the sprayed second cleaning fluid from the chamber;
• and
• spraying a rinse fluid from the nozzle over the walls of the chamber.

An apparatus for removing baked on residues from a sterilizer chamber, the apparatus comprising:

• means for mounting a lid over an opening to the chamber such that a nozzle mounted on the lid extends into an interior of the chamber;
• a means for pumping a first cleaning fluid from a first source of cleaning fluid to the nozzle such that the nozzle sprays the first cleaning fluid over walls of the chamber, thereby removing baked on residues from the walls of the chamber;
• and,
• a means for pumping the sprayed first cleaning fluid from the chamber.

An apparatus for removing baked on residues from a sterilizer chamber, the apparatus comprising:

• a reservoir of an alkaline cleaning fluid;
• a reservoir of an acid cleaning fluid;
• a lid configured to close and seal an opening to the sterilizer;
• a nozzle mounted to the lid which sprays the acid and alkaline cleaning fluids into the chamber, the sprayed cleaning fluids removing baked on residues from the sterilizer chamber;
• a first fluid supply line selectively fluidically connects each of the reservoirs with the nozzle;
• a second fluid supply line carries the cleaning fluids from the chamber;
• a pump pumps the acid and alkaline cleaning fluids from the chamber through the second fluid supply line.