Exposure apparatus, exposure method and method for manufacturing devices
AssigneeNikon Corporation
InventorKazuya Ota
Life of this patent
Estimating the term…
Abstract
In this exposure apparatus, position information such as the position, inclination, or shape of a first mirror, a second mirror, a third mirror, and a fourth mirror constituting a projection optical system PO is measured with a mirror monitor mechanism. Based on the obtained position information, the position or inclination or shape or the like of the first mirror, the second mirror, the third mirror, and the fourth mirror is corrected by actuators serving as a correction mechanism. As a result, in the case where changes occur in the projection optical system, these can be corrected in order to maintain the exposure conditions.
Claims87
An exposure apparatus which illuminates a pattern formed on a mask with exposure light to transfer said pattern onto a substrate, comprising:
- a projection optical system that has at least one reflection type optical element and guides exposure light from said mask onto said substrate;
- a detection device that detects position information of said reflection type optical element at a position on said reflection type optical element where said exposure light is irradiated;
- and
- a correction device that corrects said optical element based on said position information.
An exposure method comprising:
- illuminating a pattern formed on a mask with exposure light;
- transferring said pattern onto a substrate by way of a projection optical system including at least one reflection type optical element;
- detecting with a detection device position information regarding said reflection type optical element at an irradiation position where said reflection type optical element is irradiated with said exposure light;
- and
- correcting said optical element with a correction device based on said position information.
An exposure apparatus which irradiates an exposure beam generated from an illumination source onto a mask and exposes a substrate with said exposure beam via said mask, comprising:
- at least one reflection optical element arranged on a path through which said exposure beam passes;
- and
- a detection device that irradiates a measuring beam onto a reflection surface of said at least one reflection type optical element and detects positional information of said at least one reflection type optical element, said measuring beam having an incident direction different from that of said exposure beam.
An exposure method comprising:
- irradiating an exposure beam generated from an illumination source onto a mask;
- exposing a substrate with the exposure beam via said mask;
- irradiating a measuring beam onto a reflection surface of at least one reflection type optical element which is arranged on a path through which said exposure beam passes, so that position information regarding at least one point on said reflection surface is detected, said measuring beam having an incident direction different from said exposure beam;
- and
- detecting position information regarding at least one point on said reflection surface.
An exposure apparatus which transfers a predetermined pattern onto a substrate, comprising:
- an optical system arranged in an optical path of an exposure beam based on said predetermined pattern and which guides said exposure beam onto said substrate, said optical system comprising at least one reflection type optical element arranged in the optical path of said exposure beam;
- a reference member arranged at a predetermined position on said exposure apparatus;
- and
- a detection device that detects relative position information of said reflection type optical element arranged in the optical path of said exposure beam with respect to a reference position determined by said reference member.
An exposure method for transferring a predetermined pattern onto a substrate, comprising:
- guiding an exposure beam based on said predetermined pattern onto said substrate using an optical system, said optical system having at least one reflection type optical element arranged in an optical path of said exposure beam;
- and
- detecting relative position information of said reflection type optical element arranged in the optical path of said exposure beam with respect to a predetermined reference position.
A manufacturing method for an exposure apparatus which transfers a predetermined pattern onto a substrate, comprising:
- arranging an optical system for guiding an exposure beam onto said substrate in the optical path of said exposure beam based on said predetermined pattern, the arranging of said optical system includes arranging at least one reflection type optical element in the optical path of said exposure beam;
- providing a reference member at a predetermined position on said apparatus;
- and
- providing a detection device for detecting relative position information of said reflection type optical element arranged in the optical path of said exposure beam with respect to a reference position determined from said reference member.
An exposure apparatus which transfers a predetermined pattern onto a substrate, comprising:
- an optical system arranged in an optical path of an exposure beam based on said predetermined pattern and which guides said exposure beam onto said substrate, said optical system comprising at least one reflection type optical element arranged in the optical path of said exposure beam;
- a reference condition determining device which determines a reference arrangement condition of said optical system including said reflection type optical element based on optical characteristic information of said optical system;
- and
- a detection device that detects displacement information from said reference arrangement condition for said reflection type optical element arranged in the optical path of said exposure beam.
An exposure method for transferring a predetermined pattern onto a substrate, comprising:
- arranging an optical system having at least one reflection type optical element in an optical path of an exposure beam based on said predetermined pattern;
- guiding said exposure beam based on said predetermined pattern onto said substrate;
- detecting optical characteristic information of said optical system;
- determining a reference arrangement condition of said optical system having said reflection type optical element based on the detected optical characteristic information;
- and
- detecting displacement information for said reflection type optical element arranged in the optical path of said exposure beam from said reference arrangement condition.
A manufacturing method for an exposure apparatus which transfers a predetermined pattern onto a substrate, comprising:
- arranging an optical system for guiding an exposure beam onto said substrate in the optical path of said exposure beam based on said predetermined pattern, said optical system having at least one reflection type optical element arranged in the optical path of said exposure beam;
- determining a reference arrangement condition of said optical system having said reflection type optical element, based on optical characteristic information of said optical system;
- and
- providing a detection device for detecting displacement information of said reflection type optical element arranged in the optical path of said exposure beam from said reference arrangement condition.
An exposure method for exposing a substrate to an exposure beam based on a predetermined pattern via an optical system having a plurality of optical elements including at least one reflection type optical element, comprising:
- detecting position information for each of said optical elements;
- and
- correcting optical characteristics of said optical system based on the position information detected for each of said optical elements.
An exposure apparatus for exposing a substrate to an exposure beam based on a predetermined pattern via an optical system having a plurality of optical elements including at least one reflection type optical element, comprising:
- a detection device which detects position information for each of said optical elements;
- and
- a correction device which is electrically connected to said detection device and to each of said optical elements, and which corrects optical characteristics of said optical system based on the position information detected for each of said optical elements.
A manufacturing method for an exposure apparatus for exposing a substrate to an exposure beam based on a predetermined pattern via an optical system having a plurality of optical elements including at least one reflection type optical element, comprising:
- providing a detection device which detects position information for each of said optical elements;
- and
- electrically connecting a correction device which corrects optical characteristics of said optical system based on the position information detected for each of said optical elements to said detection device and to each of said optical elements.
Dependencies are inferred from the claim text.