LCD having barrier layer in same plane as gate electrode and method of fabricating

A method of fabricating an array substrate for a liquid crystal display device, the method comprising the steps of:

• forming a first metal layer including a gate line, a gate electrode, and a barrier upon a substrate, wherein the barrier is spaced apart from the gate electrode;
• forming a gate insulating layer to cover the first metal layer;
• forming an amorphous silicon layer upon the gate insulating layer;
• forming a doped amorphous silicon layer upon the amorphous silicon layer;
• forming both an island-shaped active layer from the amorphous silicon layer and an island-shaped ohmic contact layer from the doped amorphous silicon layer that are disposed over the gate electrode;
• forming a second metal layer including a data line, a source electrode, and a drain electrode, the drain electrode having a first portion disposed upon the ohmic contact layer and a second portion disposed upon the gate insulating layer and over the barrier;
• and
• forming a pixel electrode to overlap the second portion of the drain electrode such that the pixel electrode electrically contacts the drain electrode.