Monolithic semiconductor device and method of manufacturing the same
AssigneeSeiko Epson Corporation
InventorsSimon Tam, Piero Migliorato
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Abstract
A monolithic semiconductor device comprising a substrate, a layer of photoconductive material formed on the substrate, a transparent insulator formed on the photoconductive material and a layer of material which emits light when electrically stimulated, said layer of light emitting material being formed on the transparent insulator. The light emitting material is preferably an organic electro-luminescent material such as a polymer. Particular application of the device is in implementing an analog based neural network and by selection and arrangement of various components the device may also act as a display. A method of manufacturing the device is also disclosed.
Claims17
A monolithic semiconductor device comprising a substrate, a layer of photoconductive material formed on the substrate, a transparent insulator formed on the photoconductive material and a layer of material which emits light when electrically stimulated, said layer of light emitting material being formed on the transparent insulator.
A method of manufacturing a monolithic semiconductor device comprising the steps of providing a substrate, forming a layer of photoconductive material on the substrate, forming a transparent insulator on the photoconductive material, and forming on the transparent insulator a layer of material which emits light when electrically stimulated.
Dependencies are inferred from the claim text.