Back to results
US 6,548,144 B1Granted
Semispherical microstructure, microlens and method of fabricating the same
AssigneeCanon Kabushiki Kaisha
InventorsTakayuki Teshima, Takayuki Yagi
Life of this patent
Estimating the term…
Abstract
A semispherical microstructure includes a substrate, an insulating mask layer, and an electrodeposition layer. The substrate has an electrically-conductive portion. The mask layer is formed on the electrode layer or electrically-conductive portion of the substrate and includes an opening formed in the mask layer to expose the electrically-conductive portion at the opening. The electrodeposition layer is formed of organic compound electrodeposited in the opening and on the mask layer around the opening.
Claims22
A semispherical microstructure comprising:
- a substrate having an electrically-conductive portion;
- an insulating mask layer on said electrically-conductive portion of said substrate, said insulating mask layer including a first opening therein to expose said electrically-conductive portion;
- and
- an electrodeposited organic compound layer formed in said first opening and on said mask layer, said electrodeposited organic compound layer having an isotropic shape with respect to a center of the first opening.
1 more element
Dependencies are inferred from the claim text.