Method for manufacturing a chemically adsorbed film and a chemical adsorbent solution for the method
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorKazufumi Ogawa
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Abstract
The methods of forming a chemically adsorbed film by contacting a substrate with a solution mixture containing an alkoxysilane surface active agent, a non-aqueous solvent and a silanol-condensing catalyst to form a film covalently bonded to the substrate via siloxane bonds. These methods do not generate hydrochloric acid gas in forming the films and allow practical reaction rates.
Claims2
A method of forming a chemically adsorbed film on a substrate having active hydrogen groups on a surface thereof, comprising:
- preparing a solution mixture comprising an alkoxysilane surface active agent, an active hydrogen-free non-aqueous solvent and a silanol-condensing catalyst,
- contacting said substrate with said solution mixture,
- reacting said alkoxysilane surface active agent and silanol condensing catalyst on the surface of said substrate having active hydrogen groups to form a chemically adsorbed film covalently bonded to the surface of said substrate via a siloxane bond,
- wherein the contacting step results in covalently bonding molecules of said alkoxysilane surface active agent to the surface of said substrate via a siloxane bond,
- evaporating said non-aqueous solvent on the substrate;
- and
- subjecting said substrate and said alkoxysilane surface active agent to a reaction with water to form a polymer coating film covalently bonded to the surface of said substrate via a siloxane bond.
A method of forming a chemically adsorbed film on a substrate having active hydrogen groups on a surface thereof, comprising:
- preparing a solution mixture comprising a silane surface active agent, an active hydrogen-free non-aqueous solvent and a silanol-condensing catalyst,
- contacting said substrate with said solution mixture, and
- reacting said silane surface active agent and silanol-condensing catalyst on the surface of said substrate having active hydrogen groups to form a chemically adsorbed film covalently bonded to the surface of said substrate via a siloxane bond,
- wherein said silane surface active agent is at least one selected from the group consisting of hexaalkoxy disiloxane, octaalkoxy trisiloxane, dialkoxysilane, trialkoxysilane and tetraalkoxysilane and wherein the contacting step results in covalently bonding molecules of said silane surface active agent to the surface of said substrate via a siloxane bond:
- evaporating said non-aqueous solvent on the substrate;
- and
- subjecting an alkoxy group in said silane surface active agent remaining on the surface of said substrate to a reaction with water to form a film which comprises a polysiloxane and is a film covalently bonded to the surface of said substrate via a siloxane bond.
Dependencies are inferred from the claim text.