Process for manufacturing packaging film

The process according to claim wherein, prior to the SiOx coating, the substrate is subjected to a plasma pretreatment.

A process for manufacturing a packaging film that is transparent to UV light and has a barrier action against water vapor and gases, the packaging film includes a substrate film of a polyolefin or polyamide with a ceramic coating layer of SiOx, where x is a number from 1.5 to 1.8, the thickness of the ceramic coating layer is 10 nm to 2 μm, the ceramic coating layer of SiOx is deposited onto the polyolefin or polyamide substrate film using a vacuum thin film deposition process by depositing silicon oxide (SiO2) and elementary silicon (Si) simultaneously in vacuum in a proportion which provides said SiOx.

A process for manufacturing a packaging film that is transparent to UV light and has a barrier action against water vapor and gases, the packaging film includes a substrate film of a polyolefin or polyamide with a ceramic coating layer of SiOx, where x is a number from 1.5 to 1.8, the thickness of the ceramic coating layer is 10 nm to 2 μm, the ceramic coating layer of SiOx is deposited onto the polyolefin or polyamide substrate film using a vacuum thin film deposition process by simultaneous evaporation in vacuum of silicon oxide (SiO2) and elementary silicon (Si) in proportion such that equilibrium composition of the SiO2 and Si in vapor phase corresponds to SiOx.