Methods of forming an insulating material proximate a substrate, and methods of forming an insulating material between components of an integrated circuit
AssigneeMicron Technology, Inc.
InventorsLeonard Forbes, Kie Y. Ahn
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Abstract
In one aspect, the invention encompasses a method of forming an insulating material around a conductive component. A first material is chemical vapor deposited over and around a conductive component. Cavities are formed within the first material. After the cavities are formed, at least some of the first material is transformed into an insulative second material. In another aspect, the invention encompasses a method of forming an insulating material. Polysilicon is deposited proximate a substrate. A porosity of the polysilicon is increased. After the porosity is increased, at least some of the polysilicon is transformed into silicon dioxide.
Claims22
A method of forming an insulating material proximate a substrate comprising:
- forming polysilicon proximate a substrate;
- forming cavities within the polysilicon to enhance porosity of the polysilicon;
- and
- after forming the cavities, transforming at least some of the polysilicon into porous silicon dioxide.
A method of forming an insulating material proximate a substrate comprising:
- forming a semiconductive material proximate a substrate;
- forming cavities within the semiconductive material to enhance porosity of the semiconductive material;
- and
- after forming the cavities, transforming at least some of the semiconductive material into porous dielectric material, wherein forming semiconductive material comprises chemical vapor deposition of polysilicon.
A method of forming an insulating material, comprising:
- forming polysilicon proximate a silicon substrate;
- forming cavities within the polysilicon to enhance porosity of the polysilicon;
- after forming the cavities, transforming the polysilicon into porous silicon dioxide;
- and
- forming at least one structure over the porous silicon dioxide.
Dependencies are inferred from the claim text.