Microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpiece

An integrated tool for processing a workpiece including at least one processing station, said processing station comprising:

• a bowl assembly;
• a head assembly for receiving a workpiece and orienting the workpiece within the bowl assembly;
• a paddle assembly including a paddle and a plurality of spaced-apart fluid delivery ports, the paddle being adapted for movement relative to the workpiece when the workpiece is disposed on the head assembly within the bowl assembly and the fluid delivery ports being oriented toward the workpiece when the workpiece is disposed on the head assembly within the bowl assembly;
• a fluid inlet for supplying processing fluid to the bowl assembly;
• at least one fluid path for adjusting the position of the level of the processing fluid relative to the workpiece between a first position, wherein at least the portion of the workpiece to be processed is immersed within the processing fluid, and a second position, wherein the portion of the workpiece to be processed is not immersed within the processing fluid;
• and
• a fluid control level mechanism for selectively controlling the at least one fluid path thereby enabling the position of the level of the processing fluid relative to the workpiece to adjust between the first position and the second position.

A processing station for processing a microelectronic workpiece comprising:

• a bowl assembly;
• a head assembly adapted to position a workpiece within the bowl assembly;
• a paddle assembly including a paddle and a plurality of spaced-apart fluid delivery ports, the paddle being adapted for movement relative to the workpiece when the workpiece is positioned within the bowl assembly and the fluid delivery ports being adapted to deliver a fluid to a surface of the workpiece;
• a fluid inlet in fluid communication with the bowl assembly;
• at least one fluid path;
• and
• a fluid level control operatively coupled to the at least one fluid path and adapted to adjust a level of the processing fluid between a first level, wherein a surface of the workpiece is immersed within the processing fluid, and a second level, wherein the surface is not immersed within the processing fluid.

A processing station for processing a microelectronic workpiece comprising:

• a bowl assembly;
• a head assembly adapted to position a workpiece within the bowl assembly;
• a paddle means for delivering a first processing fluid flow through a plurality of spaced-apart fluid delivery ports to a surface of the workpiece when the workpiece is positioned within the bowl assembly;
• a fluid inlet for supplying a second processing fluid flow to the bowl assembly;
• and
• a fluid level control means adapted to adjust a level of processing fluid between a first level, wherein the surface of the workpiece is immersed within the processing fluid, and a second level, wherein the surface is not immersed within the processing fluid.