Back to results
US 6,547,919 B2Granted
Device and method for fabricating diffractive gratings
AssigneeSamsung Electronics Co., Ltd.
InventorDong-Soo Bang
Life of this patent
Estimating the term…
Abstract
There is provided a grating fabrication device and method to form gratings on a semiconductor substrate. The substrate is loaded into a reactor filled with an etchant solution, and an array of parallel light of interference light with different periods is projected onto the substrate to etch the portion of the substrate that is exposed to the light via an oxidation-reduction reaction. At the same time, the inclination angle of the substrate is selectively varied to obtain the different grating periods.
Claims8
A device for fabricating a semiconductor substrate with gratings, comprising:
- a reactor for supporting said semiconductor substrate therein, said reactor having a means for mounting said substrate and a support member mounted at the bottom of said reactor, so that one end of said mounting means is rotatably fixed to the top end of said support member, and
- a light generating means for emitting parallel lines of interference light onto said substrate,
- wherein said reactor holds a positive ion etchant solution for etching said substrate via an oxidation-reduction reaction.
Dependencies are inferred from the claim text.