Phase mask with spatially variable diffraction efficiency

Abstract

A phase mask (15) for modulating a collimated light beam passing therethrough, the light beam being diffracted to photoinduce a refractive index profile in a photosensitive optical medium, the phase mask (15) comprises a substrate (17) having an outer surface provided with a plurality of parallel grating corrugations (19). The grating corrugations (19) have a non-uniform relief depth across the outer surface for photoinducing a non-uniform refractive index profile in the photosensitive optical medium. The non-uniform relief depth is defined by a variable thin film layer (21) of variable thickness overlaying the substrate (17). The grating corrugations (19) can either be etched into the variable thin film layer (21) itself or be etched into the substrate (17), with the variable this film layer (21) being deposited on it after etching. Methods to make such phase masks are also provided.

Dependencies are inferred from the claim text.