Device for electrostatic deflection of a particle beam
AssigneeLeica Microsystems Lithography GmbH
InventorsHans-Joachim Döring, Thomas Elster
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AssigneeLeica Microsystems Lithography GmbH
InventorsHans-Joachim Döring, Thomas Elster
Estimating the term…
The invention refers to a device for electrostatic deflection of a particle beam out of a primary beam direction for the purpose of scanning a plane spanned by two coordinates X, Y, in which multiple electrodes configured as deflection wires are connected to an activation circuit and are acted upon, depending on the activation, by modifiable deflection voltages; the primary beam direction intersects the origin of coordinates X and Y, and the respective applied deflection voltage is an equivalent for the deflection of the particle beam out of the primary beam direction in the direction of coordinate X or coordinate Y. In such a device, the deflection wires are linked into deflection grids and are joined to one another and to the activation circuit in such a way that an equivalent deflection voltage is always applied to all deflection wires belonging to one and the same deflection grid.
A device for electrostatic deflection of a particle beam out of a primary beam direction for the purpose of scanning a plane spanned by two coordinates X, Y, the device comprising:
Dependencies are inferred from the claim text.