Method for preparing layered structure including oxide superconductor thin film
AssigneeSumitomo Electric Industries, Ltd.
InventorsTakao Nakamura, Michitomo Iiyama
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Abstract
The invention provides a method for preparing a layered structure comprising a lower thin film composed of an oxide superconductor and an upper thin film composed of a material different from the oxide superconductor on a substrate. The lower thin film is deposited by a molecular beam deposition process and the upper thin film is deposited by a process having a deposition rate faster than that of the molecular beam deposition process.
Claims12
A method for preparing a layered structure comprising a lower thin film composed of an oxide superconductor and an upper thin film composed of a material different from the oxide superconductor on a substrate wherein the lower thin film is deposited by a molecular beam deposition process and the upper thin film is deposited by a process other than a molecular beam deposition process, having a deposition rate faster than that of the molecular beam deposition process.
Dependencies are inferred from the claim text.