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US 6,513,736 B1Granted
Gas-assisted atomizing device and methods of making gas-assisted atomizing devices
AssigneeCorning Incorporated
InventorsPerry R Skeath, John R Saylor, Amy L Rovelstad
Life of this patent
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Abstract
Gas-assisted atomizing devices are provided that include liquid orifices, which release liquid, and gas orifices, which release gas to atomize the liquid into droplets. The atomizing devices are formed by at least a first layer and a second layer. The atomizing devices can include a gas supply network and a liquid supply network that supply gas and liquid to the gas and liquid orifices.
Claims34
An atomizing device comprising:
- a substantially planar first layer having a first opening therethrough;
- and
- a substantially planar second layer having a second opening therethrough and being laminated to the first layer such that the first and second openings are aligned to form a main gas orifice that guides a main gas in a flow direction, the second opening being bounded by at least one inner surface with at least one atomizing edge,
- wherein the first and second layers define at least one liquid orifice that supplies liquid to be atomized to the main gas orifice in a direction substantially perpendicular to the flow direction and onto the at least one inner surface of the second layer where the liquid forms a thin film.
1 more element
A gas-assisted atomizing device comprising:
- a substantially planar first layer;
- and
- a substantially planar second layer having a plurality of orifices formed therein,
- wherein the first and second layers form a gas supply network including a plurality of gas channels that supply gas to at least some of the plurality of orifices, and a liquid supply network including a plurality of liquid channels that supply liquid to at least some of the plurality of orifices.
1 more element
Dependencies are inferred from the claim text.