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US 6,511,867 B2Granted
Utilizing atomic layer deposition for programmable device
AssigneeOvonyx, Inc.
InventorsTyler A. Lowrey, Charles H. Dennison
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Abstract
In an aspect, an apparatus is provided that sets and reprograms the state of programmable devices. In an aspect, a method is provided such that an opening is formed through a dielectric exposing a contact, the contact formed on a substrate. An electrode is conformally deposited on a wall of the dielectric, utilizing atomic layer deposition (ALD). A programmable material is formed on the electrode and a conductor is formed to the programmable material. In an aspect, a barrier is conformally deposited utilizing ALD, between the electrode and the programmable material.
Claims5
A method comprising:
- forming a dielectric on a contact, the contact formed on a substrate;
- forming an opening through the dielectric exposing the contact;
- conformally depositing an electrode on a wall of the dielectric, utilizing atomic layer deposition (ALD);
- forming a programmable material on the electrode;
- and
- forming a conductor to the programmable material.
3 more elements
Dependencies are inferred from the claim text.