Apparatus for distributing gases in a chemical vapor deposition system
AssigneeApplied Materials, Inc.
InventorsInna Shmurun, Scott Hendrickson, Gwendolyn Jones, Shankar Venkataraman, Son T. Nguyen, I-Chun Eugenia Liu
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Abstract
A lid assembly for a semiconductor processing apparatus having at least two chambers comprises a lid plate having a first side and a second side and a plasma generation source mounted to the first side of the lid plate. Additionally, at least two gas boxes are coupled to the first side of the lid of the lid plate, and a divider is coupled between the plasma generation source and the at least two gas boxes.
Claims24
A lid assembly for a semiconductor processing apparatus having at least two chambers, comprising:
- a lid plate having a first side and a second side, where the second side of the lid plate is disposed over said at least two chambers;
- a plasma generation source mounted to said first side of the lid plate;
- at least two gas boxes coupled to the first side of said lid plate;
- and
- a divider coupled between said plasma generation source and said at least two gas boxes.
A semiconductor processing apparatus comprising:
- at least two chambers;
- and
- a lid assembly disposed over said at least two chambers, wherein said lid assembly comprises a lid plate having a first side and a second side, a plasma generation source mounted to said first side of said lid plate, at least two gas boxes coupled to the first side of said lid plate, and a divider coupled to said plasma generation source and said at least two gas boxes.
Dependencies are inferred from the claim text.