Electron-beam generation device and image forming apparatus

An electron-beam generation device comprising:

• an electron-source substrate having electron emitting devices;
• and
• a facing substrate disposed so as to face said electron-source substrate,
• wherein an anode-potential regulating region which a potential to accelerate electrons emitted from said electron emitting devices is applied on, a conductive member, disposed around said anode-potential regulating region with a predetermined interval therewith, which a predetermined potential is applied on, a resistive film contacting said anode-potential regulating region and said conductive member, and a recess, positioned between said anode-potential regulating region and said conductive member, which is concave with respect to said electron-source substrate is provided on said facing substrate.

An electron-beam generation device comprising:

• an electron-source substrate having electron emitting devices;
• and
• a facing substrate disposed so as to face said electron-source substrate,
• wherein an anode-potential regulating region which a potential to accelerate electrons emitted from said electron emitting devices is applied on, a conductive member, disposed around said anode-potential regulating region with a predetermined interval therewith, which a predetermined potential is applied on, a resistive film contacting said anode-potential regulating region and said conductive member, and protrusions and recesses positioned between said anode-potential regulating region and said conductive member are provided on said facing substrate.

An electron-beam generation device comprising:

• an electron-source substrate having electron emitting devices;
• and
• a facing substrate disposed so as to face said electron-source substrate,
• wherein an anode-potential regulating region which a potential to accelerate electrons emitted from said electron emitting devices is applied on, and a conductive member, disposed around said anode-potential regulating region with a predetermined interval therewith, which a predetermined potential is applied are provided on a same surface of said facing substrate facing said electron-source substrate, and wherein a multiple-scattering suppression structure for suppressing multiple scattering of secondary electrons generated by electrons emitted from said conductive member is disposed between said anode-potential regulating region and said conductive member on the same surface.

An image forming apparatus comprising:

• an electron-source substrate having electron emitting devices;
• and
• a facing substrate disposed so as to face said electron-source substrate,
• wherein an anode-potential regulating region which a potential to accelerate electrons emitted from said electron emitting devices is applied on, phosphors for emitting light by electrons emitted from the electron emitting devices, a conductive member, disposed around said anode-potential regulating region with a predetermined interval therewith, which a predetermined potential is applied on, a resistive film contacting said anode-potential regulating region and said conductive member, and a protrusion, positioned between said anode-potential regulating region and said conductive member, which is convex with respect to said electron-source substrate are provided on said facing substrate.

An image forming apparatus comprising:

• an electron-source substrate having electron emitting devices;
• and
• a facing substrate disposed so as to face said electron-source substrate,
• wherein an anode-potential regulating region which a potential to accelerate electrons emitted from said electron emitting devices is applied on, phosphors for emitting light by electrons emitted from the electron emitting devices, a conductive member, disposed around said anode-potential regulating region with a predetermined interval therewith, which a predetermined potential is applied on, a resistive film contacting said anode-potential regulating region and said conductive member, and a recess, positioned between said anode-potential regulating region and said conductive member, which is concave with respect to said electron-source substrate is provided on said facing substrate.

An image forming apparatus comprising:

• an electron-source substrate having electron emitting devices;
• and
• a facing substrate disposed so as to face said electron-source substrate,
• wherein an anode-potential regulating region which a potential to accelerate electrons emitted from said electron emitting devices is applied on, phosphors for emitting light by electrons emitted from the electron emitting devices, a conductive member, disposed around said anode-potential regulating region with a predetermined interval therewith, which a predetermined potential is applied on, a resistive film contacting said anode-potential regulating region and said conductive member, and protrusions and recesses positioned between said anode-potential regulating region and said conductive member are provided on said facing substrate.

An image forming apparatus comprising:

• an electron-source substrate having electron emitting devices;
• and
• a facing substrate disposed so as to face said electron-source substrate,
• wherein an anode-potential regulating region which a potential to accelerate electrons emitted from said electron emitting devices is applied on, phosphors for emitting light by electrons emitted from the electron emitting devices, and a conductive member, disposed around said anode-potential regulating region with a predetermined interval therewith, which a predetermined potential is applied on are provided on a same surface of said facing substrate facing said electron-source substrate, and wherein a multiple-scattering suppression structure for suppressing multiple scattering of secondary electrons generated by electrons emitted from said conductive member is disposed between said anode-potential regulating region and said conductive member on the same surface.