Inspecting system using electron beam and inspecting method using same
AssigneeHitachi, Ltd.
InventorsYasuhiro Gunji, Taku Ninomiya, Masatsugu Kametani, Masahiro Koyama, Kenjiro Yamamoto
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AssigneeHitachi, Ltd.
InventorsYasuhiro Gunji, Taku Ninomiya, Masatsugu Kametani, Masahiro Koyama, Kenjiro Yamamoto
Estimating the term…
The present invention aims to prevent degradation in performance due to a change in image quality and deflection distortions or the like in the vicinity of both ends of a scan area and detect a defect in a sample such as a semiconductor wafer or the like with high accuracy when the defect is inspected by use of an electron beam image, and allow a monitor to confirm an image area to be checked. The present invention is provided with means for comparing and checking defects in the sample, based on an image signal in which the neighborhoods of both ends of horizontal and vertical scan areas are respectively deleted under control of a blanking signal and a vertical synchronizing signal.
An inspecting system comprising:
An inspecting method using an electron beam, including an electron source for generating an electron beam, lens means for focusing the electron beam, a sample table for placing a sample thereon, electron beam scanning means for causing the focused electron beam to scan on the sample, and a detector for detecting secondary charged particles emanated from the sample, whereby the surface of the sample is inspected based on a signal obtained from the detector, said method comprising the steps:
An inspecting system comprising:
An inspecting system comprising:
An inspecting method using an electron beam, comprising the steps:
An inspecting method using an electron beam, comprising the steps:
An inspecting method using an electron beam, comprising the steps:
An inspecting method using an electron beam, comprising the steps:
Dependencies are inferred from the claim text.