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US 6,486,282 B1Granted
Polymer suitable for photoresist compositions
AssigneeClariant Finance (BVI) Limited
InventorsRalph R. Dammel, Raj Sakamuri
Life of this patent
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Abstract
The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is particularly useful when used in a photoresist composition sensitive in the deep ultraviolet region.
Claims21
A cyano containing copolymer comprising at least one ethylenic unit of structure 1 containing at least one cyano functionality, and at least one cyclic unit of structure 2, where structure 1 is
- where, R1-R4 are independently hydrogen, alkyl, O-alkyl, alkyl ester, perfluoroalkyl ester, carboxylic acid, alkylcarbonyl, carboxylate, cyano(CN), fluoroalkyl, acid or base labile group, alkylsulfonyl, sulfonate, sulfonamide, alkylsulfonamide, providing that at least one of R1-R4 contains a cyano functionality, and where structure 2 is
- where R5-R14 are independently hydrogen, (C1-C6)alkyl, halogen, carboxylic acid, (C1-C10)alkylOCOalkyl, cyano(CN), (C1-C10) secondary or tertiary carboxylate, substituted pinacol, R7 and R8 may be linked to form a cyclic non-aromatic structure, fluoroalkyl, W(CF3)2OH, where W is (C1-C6)alkyl or (C1-C6)alkyl ether, or an acid or base labile group,
- R15 and R16 are hydrogen or (C1-C4)alkyl,
- and m is 0-3.
1 more element
Dependencies are inferred from the claim text.