Coating film forming method and coating apparatus
AssigneeTokyo Electron Limited
InventorHideyuki Takamori
Life of this patent
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Abstract
A spreading state of an outline of the outer periphery of a coating solution is detected by a detecting sensor, and the rotation speed or the like of a wafer as a substrate is controlled so that a spreading speed of the outline becomes not more than a predetermined speed with no danger of producing a scratchpad. Alternatively, the width in the radius direction of a scratchpad is measured, and the rotation speed or the like of the wafer is controlled so that the width in the radius direction becomes not more than a predetermined value. Thereby, occurrence of the scratchpad is prevented or the degree thereof is decreased, thereby avoiding uncoating of the coating solution on the substrate and reducing the amount of the coating solution used.
Claims12
A coating film forming method for supplying a coating solution from a coating solution supply nozzle onto the front face of a substrate housed in a processing case to form a coating film, comprising the steps of:
- mounting the substrate on a mounting table and rotating the substrate;
- discharging the coating solution from the coating solution supply nozzle onto substantially the center of the substrate and diffusing the coating solution from substantially the center of the rotated substrate toward the outer edge;
- detecting a spreading state of an outline of the outer periphery of the diffusing coating solution;
- and
- controlling at least one of the rotation speed of the substrate, the amount of the coating solution discharged from the coating solution supply nozzle, and the speed of the coating solution discharged from the coating solution supply nozzle based on the detected state.
A coating film forming method for supplying a coating solution from a coating solution supply nozzle onto the front face of a substrate housed in a processing case to form a coating film, comprising the steps of:
- mounting the substrate on a mounting table and rotating the substrate;
- discharging the coating solution from the coating solution supply nozzle onto substantially the center of the substrate and diffusing the coating solution from substantially the center of the rotated substrate toward the outer edge;
- detecting a spreading state of an outline of the outer periphery of the diffusing coating solution;
- and
- performing at least one of supply of a thinner onto outer regions of the outline and supply of a thinner atmosphere onto the outer regions of the outline based on the detected state.
A coating film forming method for supplying a coating solution from a coating solution supply nozzle onto the front face of a substrate housed in a processing case to form a coating film, comprising the steps of:
- mounting the substrate on a mounting table and rotating the substrate;
- discharging the coating solution from the coating solution supply nozzle onto substantially the center of the substrate and diffusing the coating solution from substantially the center of the rotated substrate toward the outer edge;
- and
- detecting variations in a plurality of angles formed between a plurality of protruding portions which protrude from an irregular waveform formed by breaking the outline of the outer periphery of the diffusing coating solution.
Dependencies are inferred from the claim text.