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US 6,485,604 B1Granted
Substrate processing apparatus
AssigneeKokusai Electric Corporation
InventorsSatohiro Okayama, Kenji Etoh
Life of this patent
Estimating the term…
Abstract
A substrate processing apparatus that includes an outer tank, an inner tank, and opposed electrodes. The inner tank is provided in the outer tank and the opposed electrodes are provided in the inner tank. A distance between the opposed electrodes can be changed in a state in which the inner tank can completely confine plasma therein. The inner tank includes first and second inner tank constituent members, and the state in which the inner tank can completely confine plasma therein is established by superposing a side wall of the second inner tank constituent member on a side wall of the first inner tank constituent member.
Claims20
A substrate processing apparatus, comprising:
- an outer tank,
- an inner tank provided in said outer tank, and
- opposed electrodes provided in said inner tank, wherein
- a distance between said opposed electrodes can be changed in a state in which said inner tank can completely confine plasma therein, and
- said inner tank comprises first and second inner tank constituent members, and said state in which said inner tank can completely confine plasma therein is established by superposing a side wall of said second inner tank constituent member on a side wall of said first inner tank constituent member.
2 more elements
A substrate processing apparatus, comprising:
- an outer tank,
- an inner tank provided in said outer tank, and
- opposed electrodes provided in said inner tank, wherein
- said inner tank can completely confine plasma therein with respect to two or more different distances between said opposed electrodes, and
- said inner tank comprises first and second inner tank constituent members, and said state in which said inner tank can completely confine plasma therein is established by superposing a side wall of said second inner tank constituent member on a side wall of said first inner tank constituent member.
2 more elements
A substrate processing apparatus, comprising:
- an outer tank,
- an inner tank provided in said outer tank, and
- opposed electrodes provided in said inner tank, wherein
- a distance between said opposed electrodes can be changed in a state in which said inner tank is closed,
- said inner tank comprises first and second inner constituent members, and said inner tank is closed by superposing a side wall of said second inner tank constituent member on a side wall of said first inner tank constituent member,
- at least one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member comprises a plurality of auxiliary side walls, and
- said plurality of auxiliary side walls of one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member, and said side wall of the other of said first inner tank constituent member and said side wall of said second inner tank constituent member are superposed on each other, thereby closing said inner tank.
4 more elements
A substrate processing apparatus, comprising:
- an outer tank,
- an inner tank provided in said outer tank, and
- opposed electrodes provided in said inner tank wherein
- said inner tank can be closed with respect to two or more different distances between said opposed electrodes,
- said inner tank comprises first and second inner constituent members, and said inner tank is closed by superposing a side wall of said second inner tank constituent member on a side wall of said first inner tank constituent member,
- at least one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member comprises a plurality of auxiliary side walls, and
- said plurality of auxiliary side walls of one of said side wall of said first inner tank constituent member and said side wall of said second inner tank constituent member, and said side wall of the other of said first inner tank constituent member and said side wall of said second inner tank constituent member are superposed on each other, thereby closing said inner tank.
4 more elements
A substrate processing apparatus, comprising:
- an outer tank,
- an inner tank provided in said outer tank, and
- opposed electrodes provided in said inner tank, wherein
- a distance between said opposed electrodes can be changed in a state in which said inner tank can confine plasma therein,
- said inner tank comprises first and second inner tank constituent members,
- said state in which said inner tank can confine plasma therein is established by bringing said second inner tank constituent member into contact with said first inner tank constituent member,
- said opposed electrodes comprise first and second electrodes which are opposed to each other,
- said first electrode is disposed closer to said first inner tank constituent member,
- said second electrode is disposed closer to said second inner tank constituent member,
- said second electrode can move in a state in which said second inner tank constituent member is in contact with said first inner tank constituent member,
- said substrate processing apparatus further comprises a further inner tank constituent member coupled to said second electrode, and
- a further inner tank can be formed in said inner tank by bringing said further inner tank constituent member into abutment against said first inner tank constituent member.
9 more elements
A substrate processing apparatus, comprising:
- an outer tank,
- an inner tank provided in said outer tank, and
- opposed electrodes provided in said inner tank, wherein
- said inner tank can confine plasma therein with respect to two or more different distances between said opposed electrodes,
- said inner tank comprises first and second inner tank constituent members,
- said state in which said inner tank can confine plasma therein is established by bringing said second inner tank constituent member into contact with said first inner tank constituent member,
- said opposed electrodes comprise first and second electrodes which are opposed to each other,
- said first electrode is disposed closer to said first inner tank constituent member,
- said second electrode is disposed closer to said second inner tank constituent member,
- said second inner tank constituent member can contact said first inner tank constituent member with respect to two or more different distances between said opposed electrodes,
- said substrate processing apparatus further comprises a further inner tank constituent member coupled to said second electrode, and a further inner tank can be formed in said inner tank by bringing said further inner tank constituent member into abutment against said first inner tank constituent member.
8 more elements
A substrate processing apparatus comprising:
- an outer tank,
- an inner tank provided in said outer tank, and
- opposed electrodes provided in said inner tank, wherein
- a distance between said opposed electrodes can be changed in a state in which said inner tank is closed, and
- said inner tank comprises first and second inner tank constituent members, and said state in which said inner tank is closed is established by superposing a side wall of said second inner tank constituent member on a side wall of said first inner tank constituent member.
2 more elements
A substrate processing apparatus comprising:
- an outer tank,
- an inner tank provided in said outer tank, and
- opposed electrodes provided in said inner tank, wherein
- said inner tank can be closed with respect to two or more different distances between said opposed electrodes, and
- said inner tank comprises first and second inner tank constituent members, and said state in which said inner tank is closed is established by superposing a side wall of said second inner tank constituent member on a side wall of said first inner tank constituent member.
2 more elements
Dependencies are inferred from the claim text.