Illumination optical apparatus for illuminating a mask, method of manufacturing and using same, and field stop used therein

A method of manufacturing an illumination optical apparatus adapted to be used in an exposure apparatus which transfers a pattern on a first object onto a second object, comprising:

• preparing at least one light source;
• preparing an illumination optical system which guides light from said at least one light source onto said first object in an optical path between said at least one light source and said first object, said illumination optical system forming a plurality of illumination regions on said first object;
• and
• adjusting positional relationships between said plurality of illumination regions.

A method of illuminating a mask on which a predetermined pattern is formed, comprising:

• preparing at least one light source;
• preparing an illumination optical system which guides light from said at least one light source onto said mask in an optical path between said at least one light source and said mask, said illumination optical system forming a plurality of illumination regions on said mask;
• and
• adjusting positional relationships between said plurality of illumination regions.

An exposure apparatus which transfers a pattern on a first object onto a second object, comprising:

• at least one light source;
• and
• an illumination optical system arranged in an optical path between the at least one light source and the first object, which guides light from the at least one light source on the first object, the illumination optical system forming a plurality of illumination regions on the first object, and the plurality of illumination regions having polygonal shapes wherein:
• the pattern on the first object is transferred onto the second object while moving the first and second objects along a scan direction, and
• the plurality of illumination regions are arranged in a direction that crosses the scan direction.

An exposure method of transferring a predetermined pattern on a mask onto a substrate, comprising:

• preparing at least one light source;
• preparing an illumination optical system arranged in an optical path between the at least one light source and the mask;
• illuminating said mask with the illumination optical system;
• and
• transferring a predetermined pattern on the mask onto the substrate while moving the mask and the substrate along a scan direction, wherein:
• the illumination optical system forms a plurality of illumination regions on the mask, and
• the plurality of illumination regions are arranged in a direction that crosses the scan direction.

A projection exposure apparatus which transfers a pattern on a mask onto a substrate, comprising:

• an illumination optical system which is arranged in an optical path between a light source and the mask and which illuminates a rectangular illumination area on the mask;
• a projection optical system which is arranged in an optical path between the mask and the substrate and which forms an image of the pattern onto the substrate;
• a first stage which holds the mask;
• and
• a second stage which holds the substrate;
• wherein:
• the projection optical system has an optical axis,
• the illumination optical system forms the rectangular illumination area off the optical axis of the projection optical system,
• the pattern on the mask is transferred onto the substrate while moving the mask and the substrate along a moving direction, and
• a longitudinal direction of the rectangular illumination area intersects the moving direction.

A method of transferring a pattern on a mask onto a substrate, comprising the steps of:

• providing an illumination optical system in an optical path between a light source and the mask;
• providing a projection optical system in an optical path between the mask and the substrate;
• illuminating a rectangular illumination area on the mask;
• and
• projecting an image of the pattern onto the substrate, wherein:
• the projection optical system has an optical axis,
• the illumination optical system forms the rectangular illumination area off the optical axis of the projection optical system,
• the pattern on the mask is transferred onto the substrate while moving the mask and the substrate along a moving direction, and
• a longitudinal direction of the rectangular illumination area intersects the moving direction.

A projection exposure apparatus which transfers a pattern on a mask onto a substrate, comprising:

• an illumination optical system which is arranged in an optical path between a light source and the mask and which illuminates a rectangular illumination area on the mask;
• a projection optical system which is arranged in an optical path between the mask and the substrate and which forms an image of the pattern onto the substrate;
• a first stage which holds the mask;
• and
• a second stage which holds the substrate;
• wherein:
• the illumination optical system forms the rectangular illumination are on the mask;
• the pattern on the mask is transferred onto the substrate while moving the mask and the substrate along a moving direction, and
• a longitudinal direction of the rectangular illumination area intersects the moving direction,
• the illumination optical system including an optical member having a transmittancy distribution which changes along at least one of a direction intersecting the moving direction and a direction corresponding to the longitudinal direction.

A method of transferring a pattern on a mask onto a substrate, comprising the steps of:

• providing an illumination optical system in an optical path between a light source and the mask;
• providing a projection optical system in an optical path between the mask and the substrate;
• illuminating a rectangular illumination area on the mask;
• and
• projecting an image of the pattern onto the substrate, wherein:
• the illumination optical system forms the rectangular illumination area on the mask,
• the pattern on the mask is transferred onto the substrate while moving the mask and the substrate along a moving direction, and
• a longitudinal direction of the rectangular illumination area intersects the moving direction,
• the illumination optical system including an optical member having a transmittancy distribution which changes along at least one of a direction intersecting the moving direction and a direction corresponding to the longitudinal direction.