Polishing pad
AssigneePPG Industries Ohio, Inc.
InventorsRobert G. Swisher, Alan E. Wang
Life of this patent
Estimating the term…
Abstract
A polishing pad is described as comprising, (a) particulate polymer selected from particulate thermoplastic polymer (e.g., particulate thermoplastic polyurethane), particulate crosslinked polymer (e.g., particulate crosslinked polyurethane and/or particulate crosslinked polyepoxide) and mixtures thereof; and (b) crosslinked organic polymer binder (e.g., crosslinked polyurethane binder and/or crosslinked polyepoxide binder), which binds the particulate polymer together. The particulate polymer and crosslinked organic polymer binder are distributed substantially uniformly throughout the polishing pad, and the pad has a percent pore volume of from 2 percent by volume to 50 percent by volume, based on the total volume of said polishing pad. Polishing pad assemblies are also described.
Claims27
A polishing pad comprising:
- (a) particulate polymer selected from particulate thermoplastic polymer, particulate crosslinked polymer and mixtures thereof;
- and
- (b) crosslinked organic polymer binder, which binds said particulate polymer together, wherein said particulate polymer and said crosslinked organic polymer binder are distributed substantially uniformly throughout said pad, and said pad has a percent pore volume of from 2 percent by volume to 50 percent by volume, based on the total volume of said polishing pad.
A polishing pad comprising:
- (a) particulate polymer selected from particulate crosslinked polyurethane, particulate crosslinked polyepoxide and mixtures thereof;
- and
- (b) crosslinked organic polymer binder selected from crosslinked polyurethane binder, crosslinked polyepoxide binder and mixtures thereof, said crosslinked organic polymer binder binding said particulate polymer together, wherein said particulate polymer and said crosslinked organic polymer binder are distributed substantially uniformly throughout said pad, and said pad has a percent pore volume of from 2 percent by volume to 50 percent by volume, based on the total volume of said polishing pad.
A polishing pad assembly comprising:
- (a) a polishing pad having an upper work surface and a lower back surface;
- (b) a backing sheet having an upper surface and a lower surface;
- and
- (c) an adhesive means interposed between and in adhesive contact with the lower back surface of said polishing pad and the upper surface of said backing sheet, wherein said polishing pad (a) comprises,
- (i) particulate polymer selected from particulate thermoplastic polymer, particulate crosslinked polymer and mixtures thereof;
- and
- (ii) crosslinked organic polymer binder, which binds said particulate polymer together, wherein said particulate polymer and said crosslinked organic polymer binder are distributed substantially uniformly throughout said polishing pad, and said polishing pad has a percent pore volume of from 2 percent by volume to 50 percent by volume, based on the total volume of said polishing pad.
Dependencies are inferred from the claim text.