Light scattering apparatus and method for determining radiation exposure to plastic detectors

An apparatus for analyzing the cumulative radiation exposure which has been registered as pits within a dosimeter track etch foil, comprising:

• a high intensity light source capable of generating a collimated beam of light along an optical path which impinges on the track etch foil of a dosimeter;
• a lens positioned along the optical path to collect and focus light exiting the track etch foil;
• an optical mask positioned on the optical path to block unscattered light which has exited the track etch foil;
• and
• an optical detector positioned along the optical path to register the optical power of the scattered light exiting the track etch foil, wherein the optical power of the scattered light is proportional to the number and size of the pits in the track etch foil according to Mie scattering at the point of impingement with said collimated beam of light and may be converted to a value of cumulative radiation exposure for the dosimeter, such as a value given in rems.

A method for optically analyzing the cumulative radiation exposure of a dosimeter track etch foil, comprising:

• impinging a collimated high intensity light beam onto the surface of a track etch foil;
• masking out unscattered light from the impinging beam as it exits the track etch foil;
• collecting and measuring the optical-power of the light scattered by the track etch foil;
• and
• calculating a cumulative radiation exposure level which is proportional to the measured optical-power of the scattered light.