MOS-type semiconductor device and method for making same
AssigneeTexas Instruments Incorporated
InventorsTatsuo Shimizu, Mieko Matsumura, Shigenobu Kimura, Yutaka Hirose, Yasuhiro Nishioka
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AssigneeTexas Instruments Incorporated
InventorsTatsuo Shimizu, Mieko Matsumura, Shigenobu Kimura, Yutaka Hirose, Yasuhiro Nishioka
Estimating the term…
An MOS-type semiconductor device comprises two semiconductors separated by an insulator. The two semiconductors comprise monocrystal semiconductors, each having a crystallographic orientation with respect to the insulator (or other crystallographic/semiconductor property) different to the crystallographic orientation (or other respective property) of the other semiconductor. This arrangement of crystallographic orientations (and other crystallographic/semiconductor properties) can yield reduced unintended electron tunneling or current leakage through the insulator vis a vis a semiconductor device in which such an arrangement is not used. Methods for forming the MOS-type semiconductor devices of the invention are also provided.
An MOS-type semiconductor device comprising a first semiconductor, an insulator adjacent said first semiconductor, and a second semiconductor, wherein said first and second semiconductors are monocrystalline semiconductors having crystallographic axes and wherein the crystallographic axes of said first and second semiconductors are arranged in directions different to each other;
Dependencies are inferred from the claim text.