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AssigneeInternational Business Machines Corporation
InventorsChristopher F. Robinson, Michael S. Gordon, Scott A. Messick
Estimating the term…
A method of adjusting a lithography system or tool to enhance image quality correction is presented. The method enhances image quality correction by using a reduced dose during exposure of the lithographic test patterns. A typical lithography system (tool) comprises an exposure column unit and a control unit. The exposure column unit generates a shaped beam and directs this shaped beam through lenses and a series of deflectors to a mask which is positioned on a movable stage. The control unit provides control management for the components of the exposure column unit. The system maximizes pattern resolution using a mask having test pattern geometries that are at least the same size as the geometries of the pattern of a production mask. The reduced exposure dose used for the lithographic test patterns results in greater sensitivity to small beam setup errors. This enables finer tuning of the lithographic tool through adjustments in lens currents and correction coil currents and thereby results in improved resolution for production integrated circuits.
A method of adjusting a lithography system, said lithography system including adjustable apparatus for generating a beam and directing the beam to a production mask and onto a target area, said mask having a pattern to be projected onto the target area, said method comprising:
A method of adjusting a lithography system, said lithography system including adjustable apparatus for generating a beam and directing the beam onto a target to develop a production pattern thereon, wherein the improvement comprises:
Dependencies are inferred from the claim text.