System and method for removing contaminant particles relative to an ion beam
AssigneeAxcelis Technologies, Inc.
InventorsEric R. Harrington, Victor M. Benveniste, Michael A. Graf, Robert D. Rathmell
Life of this patent
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Abstract
A system for inhibiting the transport of contaminant particles with an ion beam includes a particle charging system for charging particles within a region through which the ion beam travels. An electric field is generated downstream relative to the charged region so as to urge charged particles away from a direction of travel for the ion beam.
Claims23
A system for inhibiting transport of particles with an ion beam comprising:
- a particle charging system for charging particles to a polarity that is different from that of the ion beam;
- and
- an electric field generator for generating an electric field downstream relative to the particle charging system, the electric field being operable to urge a charged particle located in the ion beam away from a direction of travel for the ion beam.
A system for inhibiting transport of particles with an ion beam comprising:
- a plasma generating system for providing plasma into a plasma region that generally surrounds the ion beam;
- and
- an electric field generator for generating an electric field generally parallel to a direction of travel for the ion beam and downstream relative to the plasma region;
- wherein particles located in the plasma region are charged negatively, the electric field urging negatively charged particles located in the ion beam away from the direction of travel for the ion beam.
An ion implantation system comprising:
- an ion source for emitting ions to treat a substrate located at an implantation station;
- an analyzing magnet system for diverting ions of a desired mass to an implantation trajectory;
- a particle removal system for inhibiting transport of particles with the diverted ions from the analyzing magnet system, the particle removal system comprising:
- a particle charging system for charging particles to a polarity different from that of the diverted ions;
- and
- an electric field located downstream relative to the particle charging system, the electric field being operable to urge at least some of the charged particles away from a direction of travel for the diverted ions;
- and
- a substrate supported at the implantation station for treatment with ions from the particle removal system, whereby particle contamination at the substrate is mitigated.
A system for inhibiting transport of particles with an ion beam comprising:
- means for charging particles to a charge having a polarity different from that of the ion beam;
- and
- means for generating an electric field downstream relative to the means for charging;
- wherein the electric field is operable to urge charged particles away from a direction of travel for the ion beam.
A method for inhibiting transport of particles with an ion beam, the method comprising the steps of:
- charging particles to a charge having a polarity different from that of the ion beam;
- generating an electric field downstream relative to a region in which the particles are charged;
- and
- using the electric field to urge at least some of the charge particles away from a direction of travel for the ion beam.
A method for inhibiting transport of particles with an ion beam, the method comprising the steps of:
- emitting electrons into a region through which the ion beam travels for negatively charging particles;
- generating an electric field operable to urge the charged particles away from a direction of travel for the ion beam, wherein the step of generating the electric field further includes accelerating the ion beam in the direction of travel for the ion beam downstream of the electron-emitting region.
Dependencies are inferred from the claim text.