Cleaning device with deeply reaching plasma and assisting electrodes
AssigneeAdvanced Plasma and Thin Films Technologies, Inc.
InventorsChia-Yuan Hsu, Yong-Hau Foo, Paul Hong
Life of this patent
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Abstract
A cleaning device with deeply reaching plasma and assisting electrodes has supporting racks, a chamber, a plasma sources, metallic grids. Flat boards to be cleaned such as circuit boards are located in the supporting racks. The supporting racks are disposed in the chamber. The metallic grids are disposed on two sides of the chamber. The plasma source is disposed next to the metallic grids. Electric voltage is applied to the metallic grids such that plasma from the plasma source can be pushed deeply into the supporting racks to evenly and sufficiently clean the circuit boards.
Claims33
A cleaning device with deeply reaching plasma and assisting electrodes, comprising plurality of supporting racks, said supporting racks each having openings on a front side and a rear side for permitting flat boards to be inserted there into;
- a chamber, said chamber having room therein for receiving said supporting racks;
- said chamber being capable of getting vacuum;
- plurality of plasma sources;
- said plasma sources being disposed beside two sides of said supporting racks;
- said plasma sources being capable of sending out plasma for cleaning said flat boards;
- plurality of metallic grids, said metallic grids being disposed adjacent to said supporting racks between said supporting racks and said plasma sources;
- electric voltage being applied to said metallic grids for helping said plasma of said plasma sources pushed into said supporting racks.
Dependencies are inferred from the claim text.