Monomer and a polymer obtained therefrom
AssigneeWako Pure Chemical Industries, Ltd.
InventorMotoshige Sumino
Life of this patent
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Abstract
This invention relates to a monomer shown by the general formula [1] (wherein X′ is a cyclic hydrocarbon residue containing polymerizable double bond(s), which may have a substituent, Z is a spacer or a direct bond and R is a substituted alkyl or alkenyl group having one or two protected hydroxyl groups as substituent) and a polymer containing a segment derived from the above monomer. The said polymer is useful for a resist composition, etc. utilized in the production of semiconductor elements, etc. and the said monomer is useful as a starting material for the polymer, and a resist composition using the said polymer can remarkably advantageously be used as a resist material for ArF excimer laser beams which has been considered to be a valuable technology for exposure belonging to the coming generation.
Claims7
A monomer shown by the general formula [1]
- wherein X′ is cyclic hydrocarbon residue containing polymerizable double bond(s), which may have a substituent, Z is a spacer or a direct bond and R is a alkyl or alkenyl group having one or two protected hydroxyl groups as substituent.
Dependencies are inferred from the claim text.