Photopolymerizable composition containing a polymerizable acrylic compound with hetero-substituted methyl or halo-substituted methyl at the alpha position
AssigneeFuji Photo Film Co., Ltd.
InventorKazuto Kunita
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Abstract
A photopolymerizable composition which is capable of successfully ensuring both high sensitivity and excellent storage stability is provided as a radical photopolymerization-system composition which is highest in the sensitivity and very promising out of the image-forming techniques. The photopolymerizable composition comprises a polymerizable group-containing compound having a specific structure set forth below wherein X1 and X2 each independently represent a group containing a hetero atom wherein the hetero atom is in the α-position or a halogen atom and a photopolymerization initiator.
Claims14
A photopolymerizable composition comprising a compound having a structure represented by the following formula (I) and a photopolymerization initiator:
- wherein X1 and X2 each independently represents a group containing a hetero atom wherein the hetero atom is in the α-position or a halogen atom, Ra and Rb each independently represents a hydrogen atom, a halogen atom, a cyano group or an organic residue, and X1 and X2, Ra and Rb, or X1 and Ra or Rb may combine with each other to form a cyclic structure.
Dependencies are inferred from the claim text.